Inventor · disambiguated record
Yaichiro Watakabe
Also filed as: WATAKABE YAICHIRO
17 granted patents·488 citations·filing 1978–1997
95Inventor score
Top patents by PatentIndex Score
17 records- 0196US5474864APhase shift mask and manufacturing method thereof and exposure method using phase shift maskULVAC COATING CORP·Filed 1993·Granted Dec 12, 1995·99 cites·8 claims
- 0291US4722878APhotomask materialMITSUBISHI ELECTRIC CORP·Filed 1985·Granted Feb 2, 1988·74 cites·9 claims
- 0382US5830607APhase shift mask and manufacturing method thereof and exposure method using phase shift maskULVAC COATING CORP·Filed 1997·Granted Nov 3, 1998·46 cites·3 claims
- 0482US5691090APhase shift mask and manufacturing method thereof and exposure method using phase shift maskULVAC COATING CORP·Filed 1996·Granted Nov 25, 1997·38 cites·27 claims
- 0581US5629114APhase shift mask and manufacturing method thereof and exposure method using phase shift mask comprising a semitransparent regionULVAC COATING CORP·Filed 1995·Granted May 13, 1997·37 cites·19 claims
- 0676US5674647APhase shift mask and manufacturing method thereof and exposure method using phase shift maskULVAC COATING CORP·Filed 1995·Granted Oct 7, 1997·33 cites·59 claims
- 0772US4873163APhotomask materialMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Oct 10, 1989·21 cites·11 claims
- 0871US5266424AMethod of forming pattern and method of manufacturing photomask using such methodMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Nov 30, 1993·24 cites·19 claims
- 0970US5322748APhotomask and a method of manufacturing thereof comprising trapezoidal shaped light blockers covered by a transparent layerMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Jun 21, 1994·22 cites·19 claims
- 1069US4876164AProcess for manufacturing a photomaskMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Oct 24, 1989·16 cites·7 claims
- 1160US4170502AMethod of manufacturing a gate turn-off thyristorMITSUBISHI ELECTRIC CORP·Filed 1978·Granted Oct 9, 1979·18 cites·6 claims
- 1258US4717625APhotomask materialMITSUBISHI ELECTRIC CORP·Filed 1986·Granted Jan 5, 1988·12 cites·4 claims
- 1357US4985319AProcess for manufacturing a photomaskMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Jan 15, 1991·10 cites·2 claims
- 1457US4957834AMethod for manufacturing photomaskMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Sep 18, 1990·12 cites·12 claims
- 1556US4783371APhotomask materialMITSUBISHI ELECTRIC CORP·Filed 1986·Granted Nov 8, 1988·9 cites·11 claims
- 1655US4792461AMethod of forming a photomask materialMITSUBISHI ELECTRIC CORP·Filed 1987·Granted Dec 20, 1988·9 cites·10 claims
- 1749US4678714APhotomask materialMITSUBISHI ELECTRIC CORP·Filed 1986·Granted Jul 7, 1987·8 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →