Inventor · disambiguated record
Yejin Ku
Also filed as: KU YEJIN
0 granted patents·9 pending applications·0 citations·filing 2021–2024
Top patents by PatentIndex Score
9 records- 0165US2025138416A1Resist compositions, methods for manufacturing semiconductor devices using the same and multilayered structures formed using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0264US2025130491A1Resist composition for photolithography and method for manufacturing semiconductor devices using the sameUNIV INHA RES & BUSINESS FOUND·Filed 2024·Application pending·0 cites
- 0358US2025116923A1Resist composition for photolithography and method for manufacturing semiconductor devices using the sameUNIV INHA RES & BUSINESS FOUND·Filed 2024·Application pending·0 cites
- 0455US2024295818A1Underlayer compound for photolithography, multilayered structure formed using the same, and method for manufacturing semiconductor devices using the sameUNIV INHA RES & BUSINESS FOUND·Filed 2024·Application pending·0 cites
- 0554US2024255849A1Resist compound for photolithography, method for forming the same, and method for manufacturing semiconductor devices using the sameUNIV INHA RES & BUSINESS FOUND·Filed 2023·Application pending·0 cites
- 0653US2023375927A1Underlayer compound for photolithography, multilayered structure formed using the same, and method for manufacturing semiconductor devices using the sameUNIV INHA RES & BUSINESS FOUND·Filed 2023·Application pending·0 cites
- 0752US2023375932A1Resist compound and underlayer compound for photolithography, multilayered structure formed using the same, and method for manufacturing semiconductor devices using the sameUNIV INHA RES & BUSINESS FOUND·Filed 2023·Application pending·0 cites
- 0850US2022137511A1Resist composition and method of forming pattern using the sameUNIV INHA RES & BUSINESS FOUND·Filed 2021·Application pending·0 cites
- 0943US2024027910A1Underlayer composition for photolithography, multilayered structure formed using the same, and method of manufacturing semiconductor device using the sameUNIV INHA RES & BUSINESS FOUND·Filed 2023·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →