Inventor · disambiguated record
Yinjie Cen
Also filed as: Cen Yinjie
1 granted patent·9 pending applications·0 citations·filing 2018–2023
11Inventor score
Files withROHM & HAAS ELECT MAT10
Top patents by PatentIndex Score
10 records- 0169US12024640B2UV-curing resin compositions for hard coat applicationsROHM & HAAS ELECT MAT·Filed 2021·Granted Jul 2, 2024·0 cites·5 claims
- 0266US2021115289A1Uv-curing acrylic resin compositions for thermoformable hard coat applicationsROHM & HAAS ELECT MAT·Filed 2020·Application pending·0 cites
- 0363US2024241441A1Polymer, photoresist compositions including the same, and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 0458US2023213862A1Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 0558US2024241440A1Polymer, photoresist compositions including the same, and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 0658US2020123408A1Uv-curing acrylic resin compositions for thermoformable hard coat applicationsROHM & HAAS ELECT MAT·Filed 2018·Application pending·0 cites
- 0755US2024019779A1Compounds and photoresist compositions including the sameROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 0853US2024027904A1Photoactive compounds, photoresist compositions including the same, and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2023·Application pending·0 cites
- 0953US2023314934A1Photoactive compounds, photoresist compositions including the same, and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2022·Application pending·0 cites
- 1053US2023103685A1Iodine-containing acid cleavable compounds, polymers derived therefrom, and photoresist compositionsROHM & HAAS ELECT MAT·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →