Inventor · disambiguated record
Ying-Shiou Lin
Also filed as: LIN YING-SHIOU
7 granted patents·5 pending applications·4 citations·filing 2007–2024
73Inventor score
Top patents by PatentIndex Score
12 records- 0166US8525258B2Method for controlling impurity density distribution in semiconductor device and semiconductor device made therebyHUANG TSUNG-YI·Filed 2010·Granted Sep 3, 2013·2 cites·4 claims
- 0266US8143680B2Gated diode with non-planar source regionLIN DA-WEN·Filed 2010·Granted Mar 27, 2012·2 cites·16 claims
- 0358US2022165880A1High voltage device and manufacturing method thereofRICHTEK TECHNOLOGY CORP·Filed 2022·Application pending·0 cites
- 0454US2025142873A1Depletion Type Vertical Discrete NMOS Device and Manufacturing Method ThereofRICHTEK TECHNOLOGY CORP·Filed 2024·Application pending·0 cites
- 0554US2024105844A1Native nmos device and manufacturing method thereofRICHTEK TECHNOLOGY CORP·Filed 2023·Application pending·0 cites
- 0653US8710633B2Semiconductor overlapped PN structure and manufacturing method thereofHUANG TSUNG-YI·Filed 2013·Granted Apr 29, 2014·0 cites·4 claims
- 0752US2020111906A1High voltage device and manufacturing method thereofRICHTEK TECHNOLOGY CORP·Filed 2019·Application pending·0 cites
- 0849US8524586B2Semiconductor overlapped PN structure and manufacturing method thereofHUANG TSUNG-YI·Filed 2011·Granted Sep 3, 2013·0 cites·6 claims
- 0949US7732877B2Gated diode with non-planar source regionTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jun 8, 2010·0 cites·8 claims
- 1040US8354718B2Semiconductor device including an arrangement for suppressing short channel effectsTAIWAN SEMICONDUCTOR MFG·Filed 2007·Granted Jan 15, 2013·0 cites·20 claims
- 1135US10355088B2Metal oxide semiconductor device having mitigated threshold voltage roll-off and threshold voltage roll-off mitigation method thereofRICHTEK TECHNOLOGY CORP·Filed 2017·Granted Jul 16, 2019·0 cites·8 claims
- 1235US2012217579A1High voltage device and manufacturing method thereofHUANG TSUNG-YI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →