Inventor · disambiguated record
Yong-Jhin Cho
Also filed as: CHO YONG-JHIN
21 granted patents·7 pending applications·42 citations·filing 2011–2024
92Inventor score
Top patents by PatentIndex Score
28 records- 0191US10361100B2Apparatus and methods for treating a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jul 23, 2019·7 cites·19 claims
- 0286US9027576B2Substrate treatment systems using supercritical fluidCHO YONG-JHIN·Filed 2013·Granted May 12, 2015·10 cites·8 claims
- 0383US10985036B2Substrate processing apparatus and apparatus for manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 20, 2021·3 cites·17 claims
- 0482US9941110B2Manufacturing method and fluid supply system for treating substrateSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Apr 10, 2018·3 cites·12 claims
- 0581US9534839B2Apparatus and methods for treating a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2012·Granted Jan 3, 2017·5 cites·17 claims
- 0678US10991600B2Process chamber and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Apr 27, 2021·2 cites·20 claims
- 0778US9627233B2Substrate treating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 18, 2017·4 cites·19 claims
- 0877US10825698B2Substrate drying apparatus, facility of manufacturing semiconductor device, and method of drying substrateSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Nov 3, 2020·2 cites·18 claims
- 0976US9524864B2Manufacturing method and fluid supply system for treating substrateSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Dec 20, 2016·3 cites·10 claims
- 1076US2024425988A1Apparatus for fabricating semiconductor device having upper and lower inlets for supplying supercritical fluids and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1174US8795541B2Substrate processing method and substrate processing system for performing the sameCHO YONG-JHIN·Filed 2011·Granted Aug 5, 2014·3 cites·11 claims
- 1271US11742222B2Apparatus for removing a photoresist and apparatus for manufacturing a comiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Aug 29, 2023·0 cites·19 claims
- 1367US11610788B2Process chamber and substrate processing apparatus including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Mar 21, 2023·0 cites·20 claims
- 1466US12110593B2Apparatus for fabricating semiconductor device having upper and lower inlets for supplying supercritical fluids and method of fabricating semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Oct 8, 2024·0 cites·16 claims
- 1562US11887868B2Substrate processing apparatus and apparatus for manufacturing integrated circuit deviceSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Jan 30, 2024·0 cites·17 claims
- 1659US11545373B2Apparatus for removing a photoresist and apparatus for manufacturing a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jan 3, 2023·0 cites·20 claims
- 1753US2014283886A1Substrate processing method and substrate processing system for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 1850US9394509B2Cleaning solution composition and method of cleaning semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jul 19, 2016·0 cites·15 claims
- 1948US11189503B2Substrate drying method, photoresist developing method, photolithography method including the same, and substrate drying systemSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Nov 30, 2021·0 cites·17 claims
- 2048US9934959B2Method and apparatus for purifying cleaning agentSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Apr 3, 2018·0 cites·13 claims
- 2145US9903651B2Sealing member and substrate processing apparatus including the sameJUN YONG MYUNG·Filed 2014·Granted Feb 27, 2018·0 cites·20 claims
- 2243US10818522B2Process chamber for a supercritical process and apparatus for treating substrates having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Oct 27, 2020·0 cites·17 claims
- 2343US2014360041A1Substrate treating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 2443US2014373881A1Substrate treating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 2540US10435234B2Chemical liquid supply apparatus and semiconductor processing apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Oct 8, 2019·0 cites·13 claims
- 2633US2015287590A1Method of rinsing and drying semiconductor device and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Application pending·0 cites
- 2732US2012064727A1Substrate treatment equipment and method of treating substrate using the sameOH JUNG-MIN·Filed 2011·Application pending·0 cites
- 2831US2015303036A1Substrate treatment apparatus including sealing member having atypical sectionSAMSUNG ELECTRONICS CO LTD·Filed 2015·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yong-Jhin Cho files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →