Inventor · disambiguated record
Yoshimasa Fukushima
Also filed as: FUKUSHIMA YOSHIMASA
11 granted patents·2 pending applications·610 citations·filing 1984–2017
90Inventor score
Top patents by PatentIndex Score
13 records- 0197US4565601AMethod and apparatus for controlling sample temperatureHITACHI LTD·Filed 1984·Granted Jan 21, 1986·451 cites·20 claims
- 0288US4824309AVacuum processing unit and apparatusHITACHI LTD·Filed 1986·Granted Apr 25, 1989·96 cites·9 claims
- 0383US6730916B1Electron beam lithography apparatusCANON KK·Filed 2000·Granted May 4, 2004·28 cites·43 claims
- 0475US10056226B2Charged particle beam apparatus and vibration damper for charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2017·Granted Aug 21, 2018·2 cites·8 claims
- 0566US7276709B2System and method for electron-beam lithographyHITACHI HIGH TECH CORP·Filed 2005·Granted Oct 2, 2007·2 cites·8 claims
- 0666US6744054B2Evacuation use sample chamber and circuit pattern forming apparatus using the sameHITACHI LTD·Filed 2001·Granted Jun 1, 2004·6 cites·29 claims
- 0755US8823309B2Stage deviceOGAWA HIRONORI·Filed 2010·Granted Sep 2, 2014·1 cites·10 claims
- 0852US6446950B2Travelling worktable apparatusHITACHI LTD·Filed 2001·Granted Sep 10, 2002·4 cites·3 claims
- 0952US6281024B1Semiconductor device inspection and analysis method and its apparatus and a method for manufacturing a semiconductor deviceHITACHI LTD·Filed 1999·Granted Aug 28, 2001·17 cites·10 claims
- 1050US6794665B2Electron beam drawing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Sep 21, 2004·2 cites·15 claims
- 1144US6659441B2Travelling worktable apparatusHITACHI LTD·Filed 2002·Granted Dec 9, 2003·1 cites·1 claims
- 1239US2005002012A1Stage apparatus, static pressure bearing apparatus, positioning method, exposure apparatus and method for manufacturing deviceCANON KK·Filed 2004·Application pending·0 cites
- 1338US2004250776A1Sample-setting moving stage, manufacturing apparatus for circuit pattern, and inspection apparatus for circuit patternFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →