Inventor · disambiguated record
Yoshinao Harada
Also filed as: HARADA YOSHINAO
17 granted patents·6 pending applications·313 citations·filing 1995–2024
94Inventor score
Files withSAMSUNG ELECTRONICS CO LTD7IBM5MATSUSHITA ELECTRIC INDUSTRIAL CO LTD5PANASONIC CORP3HITACHI GLOBAL STORAGE TECH1
Top patents by PatentIndex Score
23 records- 0196US6642131B2Method of forming a silicon-containing metal-oxide gate dielectric by depositing a high dielectric constant film on a silicon substrate and diffusing silicon from the substrate into the high dielectric constant filmMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Nov 4, 2003·130 cites·26 claims
- 0284US6800512B1Method of forming insulating film and method of fabricating semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Oct 5, 2004·26 cites·9 claims
- 0382US10840244B2Semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Nov 17, 2020·3 cites·20 claims
- 0482US8937368B2Semiconductor devicePANASONIC CORP·Filed 2013·Granted Jan 20, 2015·6 cites·19 claims
- 0579US5734521AMoisture-absorbent element for disk drivesIBM·Filed 1995·Granted Mar 31, 1998·39 cites·26 claims
- 0678US7157780B2Semiconductor device and method for producing the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Jan 2, 2007·21 cites·32 claims
- 0774US5970602AHead actuator assembly and method for fabricating the sameIBM·Filed 1997·Granted Oct 26, 1999·28 cites·17 claims
- 0864US12507483B2Semiconductor device and method for manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Dec 23, 2025·0 cites·20 claims
- 0963US7554156B2Semiconductor device having a field effect transistor using a high dielectric constant gate insulating film and manufacturing method of the samePANASONIC CORP·Filed 2005·Granted Jun 30, 2009·2 cites·9 claims
- 1063US2025234590A1Three-dimensional semiconductor device and method of manufacturing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 1161US7033874B2Method of forming insulating film and method of fabricating semiconductor device including plasma bias for forming a second insulating filmMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Apr 25, 2006·6 cites·4 claims
- 1260US7956413B2Semiconductor device having a field effect transistor using a high dielectric constant gate insulating film and manufacturing method of the samePANASONIC CORP·Filed 2009·Granted Jun 7, 2011·1 cites·10 claims
- 1358US2010075017A1Salty taste enhancer, food or drink and method for producing food or drinkNISHIMURA TOSHIHIDE·Filed 2008·Application pending·0 cites
- 1455US5650890AApparatus for controlling humidity in a disk drive enclosureIBM·Filed 1996·Granted Jul 22, 1997·13 cites·12 claims
- 1554US2024204068A1Semiconductor device comprising alignment keySAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1653US2024096956A1Integrated circuit semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2023·Application pending·0 cites
- 1749US6292323B1Method and apparatus for removing accumulated particles on a head in an information recording and reproducing apparatusIBM·Filed 1999·Granted Sep 18, 2001·9 cites·10 claims
- 1848US6273959B1Method of cleaning semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Aug 14, 2001·15 cites·23 claims
- 1942US9577076B2Methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Feb 21, 2017·0 cites·15 claims
- 2041US6927941B1Disk drive disk with landing zone having textured and untextured regionsHITACHI GLOBAL STORAGE TECH·Filed 1998·Granted Aug 9, 2005·6 cites·3 claims
- 2138US6000121AMethod for manufacturing an enclosed disk driveIBM·Filed 1995·Granted Dec 14, 1999·8 cites·7 claims
- 2237US2015097250A1Semiconductor Devices and Methods for Fabricating the SameSAMSUNG ELECTRONICS CO LTD·Filed 2014·Application pending·0 cites
- 2337US2013334608A1Semiconductor deviceIKOMA DAISAKU·Filed 2013·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →