Inventor · disambiguated record
Yongzhang Huang
Also filed as: HUANG YONGZHANG
18 granted patents·379 citations·filing 1999–2010
95Inventor score
Top patents by PatentIndex Score
18 records- 0196US7476855B2Beam tuning with automatic magnet pole rotation for ion implantersAXCELIS TECH INC·Filed 2006·Granted Jan 13, 2009·43 cites·29 claims
- 0295US6770888B1High mass resolution magnet for ribbon beam ion implantersAXCELIS TECH INC·Filed 2003·Granted Aug 3, 2004·51 cites·15 claims
- 0393US6777696B1Deflecting acceleration/deceleration gapAXCELIS TECH INC·Filed 2003·Granted Aug 17, 2004·71 cites·12 claims
- 0492US7547899B2Charged beam dump and particle attractorAXCELIS TECH INC·Filed 2006·Granted Jun 16, 2009·12 cites·28 claims
- 0592US6835930B2High mass resolution magnet for ribbon beam ion implantersAXCELIS TECH INC·Filed 2004·Granted Dec 28, 2004·33 cites·11 claims
- 0691US7915597B2Extraction electrode system for high current ion implanterAXCELIS TECH INC·Filed 2008·Granted Mar 29, 2011·19 cites·20 claims
- 0790US6881966B2Hybrid magnetic/electrostatic deflector for ion implantation systemsAXCELIS TECH INC·Filed 2003·Granted Apr 19, 2005·35 cites·34 claims
- 0886US6441382B1Deceleration electrode configuration for ultra-low energy ion implanterAXCELIS TECH INC·Filed 1999·Granted Aug 27, 2002·52 cites·13 claims
- 0985US7507977B2System and method of ion beam control in response to a beam glitchAXCELIS TECH INC·Filed 2006·Granted Mar 24, 2009·10 cites·34 claims
- 1081US7655930B2Ion source arc chamber sealAXCELIS TECH INC·Filed 2007·Granted Feb 2, 2010·8 cites·14 claims
- 1181US7488958B2High conductance ion sourceAXCELIS TECH INC·Filed 2005·Granted Feb 10, 2009·6 cites·24 claims
- 1278US7566887B2Method of reducing particle contamination for ion implantersAXCELIS TECH INC·Filed 2007·Granted Jul 28, 2009·10 cites·38 claims
- 1374US8183539B2High mass resolution low aberration analyzer magnet for ribbon beams and the system for ribbon beam ion implanterHUANG YONGZHANG·Filed 2010·Granted May 22, 2012·6 cites·21 claims
- 1471US7994488B2Low contamination, low energy beamline architecture for high current ion implantationAXCELIS TECH INC·Filed 2008·Granted Aug 9, 2011·5 cites·5 claims
- 1566US7701230B2Method and system for ion beam profilingAXCELIS TECH INC·Filed 2007·Granted Apr 20, 2010·2 cites·14 claims
- 1663US6774378B1Method of tuning electrostatic quadrupole electrodes of an ion beam implanterAXCELIS TECH INC·Filed 2003·Granted Aug 10, 2004·16 cites·24 claims
- 1757US7579604B2Beam stop and beam tuning methodsAXCELIS TECH INC·Filed 2006·Granted Aug 25, 2009·0 cites·32 claims
- 1851US7557363B2Closed loop dose control for ion implantationAXCELIS TECH INC·Filed 2006·Granted Jul 7, 2009·0 cites·27 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →