Inventor · disambiguated record
Yohei Ikebe
Also filed as: IKEBE Yohei
27 granted patents·12 pending applications·59 citations·filing 2014–2024
94Inventor score
Files withHOYA CORP39
Top patents by PatentIndex Score
39 records- 0198US11480867B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2021·Granted Oct 25, 2022·4 cites·21 claims
- 0297US12111566B2Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodHOYA CORP·Filed 2023·Granted Oct 8, 2024·2 cites·16 claims
- 0397US12105413B2Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2023·Granted Oct 1, 2024·2 cites·20 claims
- 0497US11815807B2Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Nov 14, 2023·2 cites·19 claims
- 0597US10481484B2Reflective mask blank, reflective mask, method for manufacturing reflective mask blank, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Nov 19, 2019·12 cites·20 claims
- 0694US11531264B2Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodHOYA CORP·Filed 2019·Granted Dec 20, 2022·4 cites·17 claims
- 0794US9864267B2Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2014·Granted Jan 9, 2018·8 cites·12 claims
- 0893US11550215B2Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Jan 10, 2023·3 cites·18 claims
- 0993US10394113B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2015·Granted Aug 27, 2019·7 cites·19 claims
- 1091US10871707B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Dec 22, 2020·7 cites·13 claims
- 1188US11187972B2Reflective mask blank, method of manufacturing reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2017·Granted Nov 30, 2021·3 cites·21 claims
- 1288US2024393675A1Reflective mask blank, reflective mask, method of manufacturing reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2024·Application pending·0 cites
- 1384US11003068B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted May 11, 2021·2 cites·20 claims
- 1483US12228852B2Reflective mask blank, reflective mask and method for manufacturing a semiconductor deviceHOYA CORP·Filed 2023·Granted Feb 18, 2025·0 cites·17 claims
- 1583US10921705B2Mask blank substrate, substrate with multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2016·Granted Feb 16, 2021·2 cites·16 claims
- 1681US12135496B2Reflective mask blank and reflective maskHOYA CORP·Filed 2023·Granted Nov 5, 2024·0 cites·20 claims
- 1778US11880130B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2022·Granted Jan 23, 2024·0 cites·19 claims
- 1878US11815806B2Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodHOYA CORP·Filed 2022·Granted Nov 14, 2023·0 cites·21 claims
- 1972US10067419B2Method for manufacturing reflective mask blank, and method for manufacturing reflective maskHOYA CORP·Filed 2014·Granted Sep 4, 2018·1 cites·11 claims
- 2070US10642149B2Reflective mask blank, reflective mask and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted May 5, 2020·0 cites·20 claims
- 2167US11914281B2Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Feb 27, 2024·0 cites·23 claims
- 2266US2024319577A1Reflective mask blank, reflective mask, and method of manufacturing reflective maskHOYA CORP·Filed 2024·Application pending·0 cites
- 2362US12411402B2Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2020·Granted Sep 9, 2025·0 cites·20 claims
- 2461US11131921B2Method for manufacturing reflective mask blank, and method for manufacturing reflective maskHOYA CORP·Filed 2018·Granted Sep 28, 2021·0 cites·12 claims
- 2560US2024377719A1Substrate with multilayer reflective film reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2022·Application pending·0 cites
- 2660US2025370324A1Multilayer reflective film-attached substrate, reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2022·Application pending·0 cites
- 2759US2024231216A1Mask blank, reflective mask, and method for producing semiconductor devicesHOYA CORP·Filed 2022·Application pending·0 cites
- 2859US2024184193A1Mask blank, reflective mask, and method for producing semiconductor deviceHOYA CORP·Filed 2022·Application pending·0 cites
- 2957US11249385B2Reflective mask blank, reflective mask, method of manufacturing same, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Feb 15, 2022·0 cites·18 claims
- 3056US2023333459A1Reflective mask blank, reflective mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2021·Application pending·0 cites
- 3155US11281090B2Substrate with a multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2018·Granted Mar 22, 2022·0 cites·19 claims
- 3253US11237472B2Reflective mask blank, reflective mask and manufacturing method thereof, and semiconductor device manufacturing methodHOYA CORP·Filed 2018·Granted Feb 1, 2022·0 cites·20 claims
- 3353US10578961B2Mask blank substrate, multi-layer reflective film coated substrate, and mask blankHOYA CORP·Filed 2017·Granted Mar 3, 2020·0 cites·19 claims
- 3451US2024069428A1Reflective mask blank, reflective mask, reflective mask manufacturing method, and semiconductor device manufacturing methodHOYA CORP·Filed 2021·Application pending·0 cites
- 3547US2017363952A1Mask blank substrate, mask blank, and methods for manufacturing them, method for manufacturing transfer mask, and method for manufacturing semiconductor deviceHOYA CORP·Filed 2015·Application pending·0 cites
- 3645US2022121102A1Reflective mask blank, reflective mask, method for producing same, and method for producing semiconductor deviceHOYA CORP·Filed 2020·Application pending·0 cites
- 3742US11892768B2Reflective mask blank, reflective mask and method of manufacturing the same, and method of manufacturing semiconductor deviceHOYA CORP·Filed 2019·Granted Feb 6, 2024·0 cites·25 claims
- 3842US2020371421A1Reflective mask blank, reflective mask and method for producing same, and method for producing semiconductor deviceHOYA CORP·Filed 2018·Application pending·0 cites
- 3941US2019369483A1Substrate with conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask and method for manufacturing semiconductor deviceHOYA CORP·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →