Inventor · disambiguated record
Yoshio Kawai
Also filed as: KAWAI YOSHIO
86 granted patents·6 pending applications·1,222 citations·filing 1979–2022
99Inventor score
Files withSHINETSU CHEMICAL CO40FUJISAWA PHARMACEUTICAL CO15CENTRAL GLASS CO LTD12MITSUBISHI GAS CHEMICAL CO6IBM4
Top patents by PatentIndex Score
92 records- 0198US7354693B2Polymer, resist protective coating material, and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 8, 2008·54 cites·8 claims
- 0294US8703384B2Positive resist composition and patterning processKOBAYASHI TOMOHIRO·Filed 2011·Granted Apr 22, 2014·11 cites·6 claims
- 0392US9244348B2Chemically amplified negative resist composition and pattern forming processMASUNAGA KEIICHI·Filed 2012·Granted Jan 26, 2016·8 cites·5 claims
- 0492US4980250ASecondary batteryMITSUBISHI GAS CHEMICAL CO·Filed 1987·Granted Dec 25, 1990·78 cites·13 claims
- 0591US7276623B2Polymerizable ester compoundsCENTRAL GLASS CO LTD·Filed 2006·Granted Oct 2, 2007·10 cites·3 claims
- 0691US6623909B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Sep 23, 2003·38 cites·20 claims
- 0790US4694004ASemicarbazide derivatives, processes for preparation thereof and pharmaceutical composition comprising the sameFUJISAWA PHARMACEUTICAL CO·Filed 1985·Granted Sep 15, 1987·33 cites·13 claims
- 0889US7332616B2Polymerizable compound, polymer, positive-resist composition, and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Feb 19, 2008·9 cites·1 claims
- 0989US4725608ASemicarbazide derivatives, processes for preparation thereof and pharmaceutical composition comprising the sameFUJISAWA PHARMACEUTICAL CO·Filed 1984·Granted Feb 16, 1988·23 cites·10 claims
- 1088US7488567B2Polymer, resist composition and patterning processPANASONIC CORP·Filed 2006·Granted Feb 10, 2009·9 cites·20 claims
- 1188US5612170APositive resist compositionSHINETSU CHEMICAL CO·Filed 1995·Granted Mar 18, 1997·72 cites·23 claims
- 1287US7666967B2Ester compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 23, 2010·5 cites·4 claims
- 1387US5356897A3-(heteroaryl)-pyrazololi[1,5-a]pyrimidinesFUJISAWA PHARMACEUTICAL CO·Filed 1992·Granted Oct 18, 1994·49 cites·8 claims
- 1486US5858995ABenzofuran derivatives useful as inhibitors of bone resorptionFUJISAWA PHARMACEUTICAL CO·Filed 1995·Granted Jan 12, 1999·77 cites·11 claims
- 1585US5880169ASulfonium salts and chemically amplified positive resist compositionsSHINETSU CHEMICAL CO·Filed 1996·Granted Mar 9, 1999·59 cites·16 claims
- 1684US5457003ANegative working resist material, method for the production of the same and process of forming resist patterns using the sameNIPPON TELEGRAPH & TELEPHONE·Filed 1993·Granted Oct 10, 1995·59 cites·31 claims
- 1783US6875556B2Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Apr 5, 2005·20 cites·9 claims
- 1883US6710148B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 23, 2004·20 cites·20 claims
- 1983US4255592AProcess for producing aromatic primary hydroperoxideMITSUBISHI GAS CHEMICAL CO·Filed 1979·Granted Mar 10, 1981·16 cites·11 claims
- 2081US6008230AQuinoline compounds as H+ -ATPasesFUJISAWA PHARMACEUTICAL CO·Filed 1996·Granted Dec 28, 1999·32 cites·9 claims
- 2178US6790591B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Sep 14, 2004·15 cites·8 claims
- 2277US6841334B2Onium salts and positive resist materials using the sameSHINETSU CHEMICAL CO·Filed 2003·Granted Jan 11, 2005·6 cites·11 claims
- 2376US7741015B2Patterning process and resist compositionSHINETSU CHEMICAL CO·Filed 2008·Granted Jun 22, 2010·14 cites·14 claims
- 2476US5624931APyrazole derivativesFUJISAWA PHARMACEUTICAL CO·Filed 1995·Granted Apr 29, 1997·29 cites·6 claims
- 2575US7125641B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·13 cites·17 claims
- 2675US6872514B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 29, 2005·13 cites·16 claims
- 2774US7125643B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·11 cites·16 claims
- 2874US5670503APyrazole derivativesFUJISAWA PHARMACEUTICAL CO·Filed 1994·Granted Sep 23, 1997·28 cites·12 claims
- 2974US5478827APyrazole derivativesFUJISAWA PHARMACEUTICAL CO·Filed 1994·Granted Dec 26, 1995·22 cites·6 claims
- 3073US10345700B2Negative-tone resist compositions and multifunctional polymers thereinIBM·Filed 2014·Granted Jul 9, 2019·1 cites·20 claims
- 3171US8617800B2Patterning processHATAKEYAMA JUN·Filed 2009·Granted Dec 31, 2013·3 cites·12 claims
- 3270US6511787B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·25 cites·7 claims
- 3370US5624787AChemically amplified positive resist compositionSHINETSU CHEMICAL CO·Filed 1995·Granted Apr 29, 1997·31 cites·22 claims
- 3467US11500285B2Multifunctional polymersIBM·Filed 2018·Granted Nov 15, 2022·0 cites·9 claims
- 3567US5856561ABisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositionsSHINETSU CHEMICAL CO·Filed 1996·Granted Jan 5, 1999·11 cites·14 claims
- 3667US4990651AProcess for producing carboxylic acid estersMITSUBISHI GAS CHEMICAL CO·Filed 1989·Granted Feb 5, 1991·9 cites·10 claims
- 3766US7067231B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Jun 27, 2006·19 cites·7 claims
- 3866US5636004AProjection exposure method and apparatusNIPPON TELEGRAPH & TELEPHONE·Filed 1995·Granted Jun 3, 1997·31 cites·16 claims
- 3966US4343959AProcess for the production of tertiary olefinMITSUBISHI GAS CHEMICAL CO·Filed 1981·Granted Aug 10, 1982·7 cites·11 claims
- 4065US11333975B2Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic componentIBM·Filed 2020·Granted May 17, 2022·0 cites·20 claims
- 4165US7189493B2Polymer, positive resist composition, and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2004·Granted Mar 13, 2007·6 cites·20 claims
- 4264US7169869B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2005·Granted Jan 30, 2007·1 cites·8 claims
- 4364US6824955B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Nov 30, 2004·7 cites·11 claims
- 4463US9580623B2Patterning process using a boron phosphorus silicon glass filmSHINETSU CHEMICAL CO·Filed 2015·Granted Feb 28, 2017·1 cites·12 claims
- 4563US7125642B2Sulfonates, polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·6 cites·19 claims
- 4663US5679496AChemically amplified positive resist compositionSHINETSU CHEMICAL CO·Filed 1995·Granted Oct 21, 1997·28 cites·16 claims
- 4762US6916592B2Esters, polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2003·Granted Jul 12, 2005·16 cites·20 claims
- 4862US5824824ASulfonium salts and chemically amplified positive resist compositionsSHINETSU CHEMICAL CO·Filed 1996·Granted Oct 20, 1998·31 cites·9 claims
- 4961US9488906B2Photomask blank and method for manufacturing photomask blankSHINETSU CHEMICAL CO·Filed 2014·Granted Nov 8, 2016·0 cites·29 claims
- 5061US6861197B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 1, 2005·6 cites·22 claims
Showing the top 50 of 92 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →