Inventor · disambiguated record
Young-Bum Koh
Also filed as: KOH YOUNG-BUM
11 granted patents·153 citations·filing 1997–2002
91Inventor score
Files withSAMSUNG ELECTRONICS CO LTD11
Top patents by PatentIndex Score
11 records- 0188US5851727APhotosensitive polymers and photoresist compositions containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Dec 22, 1998·35 cites·24 claims
- 0272US5789360ACleaning solution for use on a semiconductor wafer following chemical-mechanical polishing of the wafer and method for using sameSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Aug 4, 1998·41 cites·14 claims
- 0371US6277204B1Methods for cleaning wafers used in integrated circuit devicesSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Aug 21, 2001·14 cites·8 claims
- 0462US6280903B1Chemically amplified resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Aug 28, 2001·5 cites·8 claims
- 0559US6092539AIn-situ cleaning apparatuses for wafers used in integrated circuit devices and methods of cleaning using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Jul 25, 2000·21 cites·21 claims
- 0657US6103845AChemically amplified resist polymersSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Aug 15, 2000·11 cites·8 claims
- 0750US6043206ASolutions for cleaning integrated circuit substratesSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Mar 28, 2000·13 cites·5 claims
- 0849US6171754B1Chemically amplified resist compositionsSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Jan 9, 2001·5 cites·5 claims
- 0942US6114084AChemically amplified resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Sep 5, 2000·6 cites·6 claims
- 1037US6416927B1Chemically amplified resist compositionsSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Jul 9, 2002·1 cites·3 claims
- 1136US6713229B2Terpolymer for amplified resistSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 30, 2004·1 cites·41 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →