Inventor · disambiguated record
Yoshinori Momonoi
Also filed as: MOMONOI YOSHINORI
19 granted patents·159 citations·filing 2000–2019
93Inventor score
Top patents by PatentIndex Score
19 records- 0194US10714304B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 14, 2020·8 cites·12 claims
- 0289US8401273B2Apparatus for evaluating degradation of pattern featuresMOMONOI YOSHINORI·Filed 2010·Granted Mar 19, 2013·20 cites·13 claims
- 0389US6551445B1Plasma processing system and method for manufacturing a semiconductor device by using the sameHITACHI LTD·Filed 2000·Granted Apr 22, 2003·50 cites·32 claims
- 0486US10186399B2Scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2017·Granted Jan 22, 2019·4 cites·10 claims
- 0586US9892887B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Feb 13, 2018·3 cites·7 claims
- 0683US10340115B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2018·Granted Jul 2, 2019·2 cites·11 claims
- 0780US6475918B1Plasma treatment apparatus and plasma treatment methodHITACHI LTD·Filed 2000·Granted Nov 5, 2002·24 cites·21 claims
- 0878US9472376B2Scanning electron microscopeHITACHI HIGH TECH CORP·Filed 2013·Granted Oct 18, 2016·4 cites·10 claims
- 0971US6629538B2Method for cleaning semiconductor wafers in a vacuum environmentHITACHI LTD·Filed 2001·Granted Oct 7, 2003·14 cites·18 claims
- 1069US6713401B2Method for manufacturing semiconductor deviceHITACHI LTD·Filed 2001·Granted Mar 30, 2004·12 cites·14 claims
- 1166US6643893B2Apparatus for cleaning semiconductor wafers in a vacuum environmentHITACHI LTD·Filed 2001·Granted Nov 11, 2003·10 cites·25 claims
- 1263US10546715B2Charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2015·Granted Jan 28, 2020·1 cites·15 claims
- 1360US10101150B2Height measurement device and charged particle beam deviceHITACHI HIGH TECH CORP·Filed 2014·Granted Oct 16, 2018·1 cites·11 claims
- 1460US9123504B2Semiconductor inspection device and semiconductor inspection method using the sameYAMAGUCHI ATSUKO·Filed 2010·Granted Sep 1, 2015·1 cites·3 claims
- 1556US6977229B2Manufacturing method for semiconductor devicesRENESAS TECH CORP·Filed 2003·Granted Dec 20, 2005·5 cites·19 claims
- 1648US9521372B2Pattern measuring apparatus, pattern measuring method, and computer-readable recording medium on which a pattern measuring program is recordedHITACHI HIGH TECH CORP·Filed 2013·Granted Dec 13, 2016·0 cites·19 claims
- 1746US10665420B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted May 26, 2020·0 cites·11 claims
- 1846US10438771B2Measurement device, calibration method of measurement device, and calibration memberHITACHI HIGH TECH CORP·Filed 2016·Granted Oct 8, 2019·0 cites·15 claims
- 1943US10217604B2Charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Feb 26, 2019·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →