Inventor · disambiguated record
Yoshikazu Nagamura
Also filed as: NAGAMURA YOSHIKAZU
15 granted patents·3 pending applications·145 citations·filing 1998–2019
92Inventor score
Files withRENESAS TECH CORP7MITSUBISHI ELECTRIC CORP5DAINIPPON PRINTING CO LTD1MITSUBISHIDENKI KABUSHIKI KAIS1NAGAMURA YOSHIKAZU1
Top patents by PatentIndex Score
18 records- 0186US6340543B1Photomask, manufacturing method thereof, and semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Jan 22, 2002·49 cites·16 claims
- 0282US6277205B1Method and apparatus for cleaning photomaskMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Aug 21, 2001·19 cites·11 claims
- 0378US6209553B1Method of and apparatus for washing photomask and washing solution for photomaskMITSUBISHIDENKI KABUSHIKI KAIS·Filed 2000·Granted Apr 3, 2001·16 cites·4 claims
- 0473US7264905B2Photomask, and method and apparatus for producing the sameTOPPAN PRINTING CO LTD·Filed 2003·Granted Sep 4, 2007·9 cites·3 claims
- 0570US6071376AMethod and apparatus for cleaning photomaskMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jun 6, 2000·35 cites·4 claims
- 0667US8156451B2Method of manufacturing photomaskNAGAMURA YOSHIKAZU·Filed 2008·Granted Apr 10, 2012·5 cites·2 claims
- 0766US7582397B2Photomask, and method and apparatus for producing the sameRENESAS TECH CORP·Filed 2007·Granted Sep 1, 2009·1 cites·8 claims
- 0862US6740896B2Sensitivity adjusting method for pattern inspection apparatusRENESAS TECH CORP·Filed 2002·Granted May 25, 2004·8 cites·10 claims
- 0958US7771904B2Photomask, and method and apparatus for producing the sameRENESAS TECH CORP·Filed 2009·Granted Aug 10, 2010·0 cites·1 claims
- 1055US7585599B2Photomask, and method and apparatus for producing the sameRENESAS TECH CORP·Filed 2007·Granted Sep 8, 2009·0 cites·2 claims
- 1150US7077915B2Method of and apparatus for washing photomask and washing solution for photomaskWATANABE & CO LTD M·Filed 2003·Granted Jul 18, 2006·2 cites·6 claims
- 1245US10861786B2Semiconductor device having a multilayer structureRENESAS ELECTRONICS CORP·Filed 2019·Granted Dec 8, 2020·0 cites·13 claims
- 1344US6877151B2Photomask visual inspection systemRENESAS TECH CORP·Filed 2002·Granted Apr 5, 2005·0 cites·6 claims
- 1442US7001470B2Cleaning process for photomasksRENESAS TECH CORP·Filed 2002·Granted Feb 21, 2006·1 cites·3 claims
- 1542US2005274392A1Cleaning process for photomasksRENESAS TECH CORP·Filed 2005·Application pending·0 cites
- 1641US7926010B2Method of determining defects in photomaskDAINIPPON PRINTING CO LTD·Filed 2008·Granted Apr 12, 2011·0 cites·10 claims
- 1737US2002138219A1Quality assurance automatic display systemMITSUBISHI ELECTRIC CORP·Filed 2001·Application pending·0 cites
- 1832US2001008137A1Method of and apparatus for washing photomask and washing solution for photomaskMITSUBISHI ELECTRIC CORP·Filed 2001·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yoshikazu Nagamura files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →