Inventor · disambiguated record
Yoshihiko Nagata
Also filed as: NAGATA YOSHIHIKO
31 granted patents·6 pending applications·478 citations·filing 1989–2021
97Inventor score
Files withSHINETSU CHEMICAL CO24NAGATA YOSHIHIKO6SUMITOMO HEAVY INDUSTRIES3AGENCY IND SCIENCE TECHN1IHI CORP1
Top patents by PatentIndex Score
37 records- 0187US8192899B2Pellicle for photolithographyNAGATA YOSHIHIKO·Filed 2010·Granted Jun 5, 2012·6 cites·7 claims
- 0282US5070733APhotoacoustic imaging methodAGENCY IND SCIENCE TECHN·Filed 1989·Granted Dec 10, 1991·62 cites·2 claims
- 0380US5286567APellicle for photolithographic maskSHINETSU CHEMICAL CO·Filed 1992·Granted Feb 15, 1994·34 cites·2 claims
- 0479US5470621AFrame-supported pellicle for dustproof protection of photomaskSHINETSU CHEMICAL CO·Filed 1994·Granted Nov 28, 1995·34 cites·5 claims
- 0578US5378514AFrame-supported pellicle for photolithographySHINETSU CHEMICAL CO·Filed 1993·Granted Jan 3, 1995·36 cites·4 claims
- 0677US5616927AFrame-supported pellicle for dustproof protection of photomaskSHINETSU CHEMICAL CO·Filed 1994·Granted Apr 1, 1997·30 cites·3 claims
- 0776US11446844B2Kneading device with a detection unit detecting a dispersion degreeNIHON SPINDLE MFG CO LTD·Filed 2019·Granted Sep 20, 2022·1 cites·20 claims
- 0876US5693382AFrame-supported pellicle for dustproof protection of photomask in photolithographySHINETSU CHEMICAL CO·Filed 1996·Granted Dec 2, 1997·36 cites·4 claims
- 0975US5139633AFilm-forming on substrate by sputteringSHINETSU CHEMICAL CO·Filed 1991·Granted Aug 18, 1992·28 cites·4 claims
- 1068US5691088APellicle for protection of photolithographic maskSHINETSU CHEMICAL CO·Filed 1992·Granted Nov 25, 1997·26 cites·4 claims
- 1168US5209996AMembrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the sameSHINETSU CHEMICAL CO·Filed 1992·Granted May 11, 1993·27 cites·1 claims
- 1266US8956788B2Pellicle for lithography and a method of making thereofNAGATA YOSHIHIKO·Filed 2012·Granted Feb 17, 2015·1 cites·1 claims
- 1366US5300348AFrame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesiveSHINETSU CHEMICAL CO·Filed 1992·Granted Apr 5, 1994·20 cites·3 claims
- 1465US7067222B2Pellicle for lithographySHINETSU CHEMICAL CO·Filed 2003·Granted Jun 27, 2006·6 cites·2 claims
- 1562US5540577AInjection molding machine capable of reducing the work required to an operatorSUMITOMO HEAVY INDUSTRIES·Filed 1994·Granted Jul 30, 1996·23 cites·15 claims
- 1660US5419972AFrame-supported pellicle for dustproof protection of photomaskSHINETSU CHEMICAL CO·Filed 1994·Granted May 30, 1995·15 cites·2 claims
- 1759US5199055AX-ray lithographic mask blank with reinforcementSHINETSU CHEMICAL CO·Filed 1992·Granted Mar 30, 1993·14 cites·12 claims
- 1858US5326649AX-ray transmitting membrane for mask in x-ray lithography and method for preparing the sameSHINETSU CHEMICAL CO·Filed 1992·Granted Jul 5, 1994·17 cites·4 claims
- 1954US2024017492A1Three-dimensional modeling device and three-dimensional modeling methodIHI CORP·Filed 2021·Application pending·0 cites
- 2052US7432023B2Method for producing a pellicle for lithographySHINETSU CHEMICAL CO·Filed 2005·Granted Oct 7, 2008·0 cites·6 claims
- 2152US5234609AX-ray permeable membrane for X-ray lithographic maskSHINETSU CHEMICAL CO·Filed 1992·Granted Aug 10, 1993·14 cites·4 claims
- 2248US7927763B2Pellicle for photolithography and pellicle frameSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 19, 2011·0 cites·6 claims
- 2347US8590281B2Method for hermetically closing an air-tight bag for pellicleNAGATA YOSHIHIKO·Filed 2011·Granted Nov 26, 2013·0 cites·7 claims
- 2447US7604904B2Pellicle for lithographySHINETSU CHEMICAL CO·Filed 2004·Granted Oct 20, 2009·1 cites·12 claims
- 2547US6396579B1Method, apparatus, and system for inspecting transparent objectsSHINETSU CHEMICAL CO·Filed 1998·Granted May 28, 2002·17 cites·2 claims
- 2645US5327808AMethod for the preparation of a frame-supported pellicle for photolithographySHINETSU CHEMICAL CO·Filed 1993·Granted Jul 12, 1994·14 cites·3 claims
- 2744US2006229159A1Balance training deviceNAGATA YOSHIHIKO·Filed 2003·Application pending·0 cites
- 2843US8273507B2Pellicle for lithography and a method for making the sameNAGATA YOSHIHIKO·Filed 2010·Granted Sep 25, 2012·0 cites·5 claims
- 2941US2007187871A1Mold-supporting apparatus, molding machine, and molding methodSUMITOMO HEAVY INDUSTRIES·Filed 2005·Application pending·0 cites
- 3040US2012247069A1Method for storing a pellicleNAGATA YOSHIHIKO·Filed 2012·Application pending·0 cites
- 3138US5368675AMethod for the preparation of a frame-supported pellicle for photolithographySHINETSU CHEMICAL CO·Filed 1993·Granted Nov 29, 1994·6 cites·4 claims
- 3238US5098515AMethod for the preparation of a silicon carbide-silicon nitride composite membrane for x-ray lithographySHINETSU CHEMICAL CO·Filed 1990·Granted Mar 24, 1992·4 cites·6 claims
- 3338US2002142768A1Position display system using wireless mobile terminalsFiled 2001·Application pending·0 cites
- 3433US5308567AMethod for the preparation of a resin membraneSHINETSU CHEMICAL CO·Filed 1992·Granted May 3, 1994·2 cites·8 claims
- 3533US5089085ASilicon carbide membrane for x-ray lithography and method for the prepartion thereofSHINETSU CHEMICAL CO·Filed 1990·Granted Feb 18, 1992·2 cites·6 claims
- 3632US5246802AX-ray permeable membrane for X-ray lithographic maskSHINETSU CHEMICAL CO·Filed 1991·Granted Sep 21, 1993·2 cites·2 claims
- 3732US2008087097A1Strain Measuring Device And Fixing Method Of Strain MeasuringSUMITOMO HEAVY INDUSTRIES·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →