Inventor · disambiguated record
Yoshinori Nakayama
Also filed as: NAKAYAMA YOSHINORI
67 granted patents·6 pending applications·1,125 citations·filing 1985–2017
99Inventor score
Top patents by PatentIndex Score
73 records- 0196US7326942B2Ion beam system and machining methodHITACHI HIGH TECH CORP·Filed 2005·Granted Feb 5, 2008·24 cites·16 claims
- 0294US7078691B2Standard reference for metrology and calibration method of electron-beam metrology system using the sameHITACHI HIGH TECH CORP·Filed 2005·Granted Jul 18, 2006·20 cites·11 claims
- 0394US6518656B1Reduced thickness optical image pickup device with improved sealing and method of making sameSONY CORP·Filed 2000·Granted Feb 11, 2003·89 cites·10 claims
- 0492US6818911B2Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing methodCANON KK·Filed 2003·Granted Nov 16, 2004·46 cites·29 claims
- 0592US6159644AMethod of fabricating semiconductor circuit devices utilizing multiple exposuresHITACHI LTD·Filed 1996·Granted Dec 12, 2000·100 cites·7 claims
- 0692US5334282AElectron beam lithography system and methodHITACHI LTD·Filed 1991·Granted Aug 2, 1994·78 cites·17 claims
- 0791US7952083B2Ion beam system and machining methodHITACHI HIGH TECH CORP·Filed 2008·Granted May 31, 2011·11 cites·6 claims
- 0891US7109494B2Deflector, method of manufacturing deflector, and charged particle beam exposure apparatus using deflectorHITACHI HIGH TECH CORP·Filed 2004·Granted Sep 19, 2006·45 cites·25 claims
- 0991US6953938B2Deflector, method of manufacturing deflector, and charged particle beam exposure apparatusHITACHI LTD·Filed 2003·Granted Oct 11, 2005·35 cites·5 claims
- 1089US7425714B2Measurement method of electron beam current, electron beam writing system and electron beam detectorHITACHI HIGH TECH CORP·Filed 2005·Granted Sep 16, 2008·12 cites·12 claims
- 1188US5097138AElectron beam lithography system and methodHITACHI LTD·Filed 1990·Granted Mar 17, 1992·52 cites·7 claims
- 1287US7276707B2Deflector, method of manufacturing deflector, and charged particle beam exposure apparatusHITACHI LTD·Filed 2005·Granted Oct 2, 2007·9 cites·21 claims
- 1387US5424173AElectron beam lithography system and methodHITACHI LTD·Filed 1993·Granted Jun 13, 1995·49 cites·18 claims
- 1486US6121625ACharged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 1998·Granted Sep 19, 2000·30 cites·11 claims
- 1583US8373113B2Calibration standard member, method for manufacturing the member and scanning electronic microscope using the memberHITACHI HIGH TECH CORP·Filed 2009·Granted Feb 12, 2013·7 cites·20 claims
- 1683US7947964B2Charged particle beam orbit corrector and charged particle beam apparatusHITACHI HIGH TECH CORP·Filed 2007·Granted May 24, 2011·6 cites·18 claims
- 1783US7423274B2Electron beam writing system and electron beam writing methodHITACHI HIGH TECH CORP·Filed 2006·Granted Sep 9, 2008·7 cites·12 claims
- 1882US5562800AWafer transport methodHITACHI LTD·Filed 1994·Granted Oct 8, 1996·69 cites·21 claims
- 1980US7612334B2Standard reference component for calibration, fabrication method for the same, and scanning electron microscope using the sameHITACHI HIGH TECH CORP·Filed 2007·Granted Nov 3, 2009·5 cites·15 claims
- 2079US8263929B2Standard member for correction, scanning electron microscope using same, and scanning electron microscope correction methodNAKAYAMA YOSHINORI·Filed 2009·Granted Sep 11, 2012·6 cites·20 claims
- 2179US5283440AElectron beam writing system used in a cell projection methodHITACHI LTD·Filed 1991·Granted Feb 1, 1994·34 cites·10 claims
- 2278US7875850B2Standard component for calibration and electron-beam system using the sameHITACHI HIGH TECH CORP·Filed 2008·Granted Jan 25, 2011·8 cites·13 claims
- 2378US7834997B2Standard component for calibration and calibration method using it and electro beam systemHITACHI HIGH TECH CORP·Filed 2007·Granted Nov 16, 2010·4 cites·23 claims
- 2478US7476882B2Calibration method for electron-beam system and electron-beam systemHITACHI HIGH TECH CORP·Filed 2006·Granted Jan 13, 2009·4 cites·14 claims
- 2577US7595482B2Standard component for length measurement, method for producing the same, and electron beam metrology system using the sameHITACHI HIGH TECH CORP·Filed 2008·Granted Sep 29, 2009·7 cites·16 claims
- 2677US7365306B2Standard member for length measurement, method for producing the same, and electron beam length measuring device using the sameHITACHI HIGH TECH CORP·Filed 2003·Granted Apr 29, 2008·10 cites·15 claims
- 2777US5229607ACombination apparatus having a scanning electron microscope thereinHITACHI LTD·Filed 1991·Granted Jul 20, 1993·47 cites·29 claims
- 2875US7750296B2Scanning electron microscope and calibration of image distortionHITACHI HIGH TECH CORP·Filed 2007·Granted Jul 6, 2010·3 cites·9 claims
- 2975US6441383B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2001·Granted Aug 27, 2002·6 cites·1 claims
- 3075US6262428B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Jul 17, 2001·6 cites·3 claims
- 3174US8735816B2Standard member for calibration and method of manufacturing the same and scanning electron microscope using the sameNAKAYAMA YOSHINORI·Filed 2011·Granted May 27, 2014·4 cites·18 claims
- 3274US7105842B2Method of charged particle beam lithography and equipment for charged particle beam lithographyCANON KK·Filed 2004·Granted Sep 12, 2006·10 cites·14 claims
- 3374US6946665B2Charged particle beam exposure method and apparatus and device manufacturing method using the apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Sep 20, 2005·18 cites·9 claims
- 3473US5527501AProcess for producing piezoelectric ceramic sheet and dielectric ceramic sheetNIPPON SOKEN·Filed 1994·Granted Jun 18, 1996·27 cites·9 claims
- 3573US5396077AElectron beam lithography apparatus having electron optics correction systemHITACHI LTD·Filed 1994·Granted Mar 7, 1995·24 cites·5 claims
- 3672US6946662B2Multi-charged beam lens, charged-particle beam exposure apparatus using the same, and device manufacturing methodHITACHI LTD·Filed 2003·Granted Sep 20, 2005·11 cites·19 claims
- 3771US7034321B2Electron beam exposure apparatus and electron beam measurement moduleCANON KK·Filed 2003·Granted Apr 25, 2006·9 cites·13 claims
- 3871US6768118B2Electron beam monitoring sensor and electron beam monitoring methodHITACHI LTD·Filed 2003·Granted Jul 27, 2004·8 cites·11 claims
- 3970US9110384B2Scanning electron microscopeOMORI SEIKO·Filed 2011·Granted Aug 18, 2015·3 cites·8 claims
- 4070US6320198B1Charged particle beam lithography apparatus for forming pattern on semi-conductorHITACHI LTD·Filed 2000·Granted Nov 20, 2001·4 cites·1 claims
- 4169US5650631AElectron beam writing systemHITACHI LTD·Filed 1995·Granted Jul 22, 1997·22 cites·30 claims
- 4267US6511048B1Electron beam lithography apparatus and pattern forming methodHITACHI LTD·Filed 1998·Granted Jan 28, 2003·20 cites·15 claims
- 4365US8268209B2Pattern forming method and its moldOGINO MASAHIKO·Filed 2007·Granted Sep 18, 2012·3 cites·7 claims
- 4465US5601686AWafer transport methodHITACHI LTD·Filed 1996·Granted Feb 11, 1997·26 cites·22 claims
- 4564US4737973ACrystal monochromatorHITACHI LTD·Filed 1986·Granted Apr 12, 1988·15 cites·6 claims
- 4663US8064681B2Method and apparatus for inspecting reticleOKAI NOBUHIRO·Filed 2008·Granted Nov 22, 2011·5 cites·16 claims
- 4763US5831273ACharged particle beam lithography method and apparatus thereofHITACHI LTD·Filed 1997·Granted Nov 3, 1998·16 cites·18 claims
- 4861US7198039B2Valve control device reducing noiseNIPPON SOKEN·Filed 2006·Granted Apr 3, 2007·4 cites·20 claims
- 4958US2001029462A1Schedule retrieval method for controlling schedules and schedule server apparatus with multistageous idle-time retrieval meansFiled 2001·Application pending·0 cites
- 5057US2001014916A1Schedule retrieval method for controlling schedules and schedule server apparatus with multistageous idle-time retrieval meansFiled 2001·Application pending·0 cites
Showing the top 50 of 73 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →