Inventor · disambiguated record
Yoshimi Shiramizu
Also filed as: SHIRAMIZU YOSHIMI
15 granted patents·4 pending applications·418 citations·filing 1994–2005
94Inventor score
Top patents by PatentIndex Score
19 records- 0187US5762779AMethod for producing electrolyzed waterNEC CORP·Filed 1995·Granted Jun 9, 1998·84 cites·11 claims
- 0277US5599438AMethod for producing electrolyzed waterNEC CORP·Filed 1996·Granted Feb 4, 1997·54 cites·4 claims
- 0375US5543030AMethod for producing electrolyzed waterNEC CORP·Filed 1995·Granted Aug 6, 1996·42 cites·7 claims
- 0472US6277767B1Method for cleaning semiconductor deviceNEC CORP·Filed 2000·Granted Aug 21, 2001·17 cites·16 claims
- 0569US5509970AMethod of cleaning semiconductor substrate using an aqueous acid solutionNEC CORP·Filed 1994·Granted Apr 23, 1996·43 cites·4 claims
- 0668US5824200AGeneration of electrolytically active water and wet process of a semiconductor substrateNEC CORP·Filed 1997·Granted Oct 20, 1998·35 cites·4 claims
- 0767US5522918AApparatus for analyzing organic substance and method for the sameNEC CORP·Filed 1994·Granted Jun 4, 1996·28 cites·20 claims
- 0864US6116254ACleaning method and system of semiconductor substrate and production method of cleaning solutionNEC CORP·Filed 1996·Granted Sep 12, 2000·29 cites·7 claims
- 0961US7348188B2Method for analyzing metal element on surface of waferNEC ELECTRONICS CORP·Filed 2005·Granted Mar 25, 2008·1 cites·15 claims
- 1058US6726886B2Apparatus for cleaning semiconductor deviceNEC ELECTRONICS CORP·Filed 2001·Granted Apr 27, 2004·8 cites·16 claims
- 1158US5814157AMethod for cleaning a semiconductor wafer with an improved cleaning solutionNEC CORP·Filed 1996·Granted Sep 29, 1998·23 cites·26 claims
- 1255US5549798AWet processing apparatus having individual reactivating feedback paths for anode and cathode waterNEC CORP·Filed 1995·Granted Aug 27, 1996·21 cites·78 claims
- 1352US5472513ACleaning method for semiconductor substrateNEC CORP·Filed 1994·Granted Dec 5, 1995·22 cites·6 claims
- 1445US2006149537A1Code conversion method and device for code conversionSHIRAMIZU YOSHIMI·Filed 2003·Application pending·0 cites
- 1543US6248997B1Method of analyzing substances existing in gasNEC CORP·Filed 1999·Granted Jun 19, 2001·9 cites·15 claims
- 1640US2002194995A1Retaining box, and a feeding apparatus of a semiconductor wafer, which can feed or retain a semiconductor wafer without any contamination of the semiconductor wafer caused by a hydrocarbon in air and a hydrocarbon generated from a retaining boxFiled 2002·Application pending·0 cites
- 1739US2005048659A1Method of preparing analytical sample, method of analyzing substance on surface of semiconductor substrate, and apparatus for preparing analytical sampleNEC ELECTRONICS CORP·Filed 2004·Application pending·0 cites
- 1836US2002009899A1Method and device for manufacturing semiconductor devices including insulation oxide layersNEC CORP·Filed 2001·Application pending·0 cites
- 1931US6323136B1Method of producing samples of semiconductor substrate with quantified amount of contaminationNEC CORP·Filed 1997·Granted Nov 27, 2001·2 cites·19 claims
Join the waitlist — get patent alerts
Get an alert when Yoshimi Shiramizu files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →