Inventor · disambiguated record
Yoshihiro Sugita
Also filed as: SUGITA YOSHIHIRO
7 granted patents·3 pending applications·91 citations·filing 1991–2005
85Inventor score
Top patents by PatentIndex Score
10 records- 0185US6894369B2Semiconductor device having a high-dielectric gate insulation film and fabrication process thereofFUJITSU LTD·Filed 2002·Granted May 17, 2005·37 cites·17 claims
- 0273US6740425B2Method for manufacturing copper-resin composite materialSHIPLEY CO LLC·Filed 2002·Granted May 25, 2004·15 cites·12 claims
- 0372US7521325B2Semiconductor device and method for fabricating the sameFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Apr 21, 2009·6 cites·12 claims
- 0466US6998303B2Manufacture method for semiconductor device with patterned film of ZrO2 or the likeFUJITSU LTD·Filed 2003·Granted Feb 14, 2006·12 cites·4 claims
- 0560US7514316B2Semiconductor device and method of manufacturing the sameFUJITSU MICROELECTRONICS LTD·Filed 2005·Granted Apr 7, 2009·1 cites·9 claims
- 0655US6780699B2Semiconductor device and method for fabricating the sameFUJITSU LTD·Filed 2003·Granted Aug 24, 2004·5 cites·20 claims
- 0745US5157582AComposite electronic partMURATA MANUFACTURING CO·Filed 1991·Granted Oct 20, 1992·15 cites·12 claims
- 0839US2005170665A1Method of forming a high dielectric filmFUJITSU LTD·Filed 2005·Application pending·0 cites
- 0935US2004253450A1Formaldehyde-free electroless copper plating process and solution for use in the processSHIPLEY CO LLC·Filed 2003·Application pending·0 cites
- 1031US2003003667A1Semiconductor device and method of fabricating the sameFUJITSU LTD·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →