Inventor · disambiguated record
Youji Takahashi
Also filed as: TAKAHASHI YOUJI
12 granted patents·200 citations·filing 1990–2011
91Inventor score
Top patents by PatentIndex Score
12 records- 0190US7828928B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Nov 9, 2010·10 cites·8 claims
- 0286US7335277B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2003·Granted Feb 26, 2008·24 cites·12 claims
- 0383US6586887B1High-frequency power supply apparatus for plasma generation apparatusHITACHI HIGH TECH CORP·Filed 2002·Granted Jul 1, 2003·28 cites·8 claims
- 0482US5177677APower conversion systemHITACHI LTD·Filed 1990·Granted Jan 5, 1993·87 cites·28 claims
- 0575US7247207B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted Jul 24, 2007·11 cites·13 claims
- 0667US7833382B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Nov 16, 2010·1 cites·11 claims
- 0757US7976632B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Jul 12, 2011·0 cites·10 claims
- 0855US5125347APower supply system for a linear motor type transportation systemHITACHI LTD·Filed 1990·Granted Jun 30, 1992·36 cites·18 claims
- 0948US8460467B2Vacuum processing apparatusMAKINO AKITAKA·Filed 2011·Granted Jun 11, 2013·0 cites·15 claims
- 1048US7125730B2Power supply, a semiconductor making apparatus and a semiconductor wafer fabricating method using the sameHITACHI HIGH TECH CORP·Filed 2003·Granted Oct 24, 2006·1 cites·3 claims
- 1148US7025895B2Plasma processing apparatus and methodHITACHI HIGH TECH CORP·Filed 2002·Granted Apr 11, 2006·2 cites·12 claims
- 1240US6713885B2Power supply, a semiconductor making apparatus and a semiconductor wafer fabricating method using the sameHITACHI HIGH TECH CORP·Filed 2002·Granted Mar 30, 2004·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →