Inventor · disambiguated record
Yoshikatu Tomimatu
Also filed as: TOMIMATU YOSHIKATU
12 granted patents·1 pending application·310 citations·filing 1996–2002
92Inventor score
Top patents by PatentIndex Score
13 records- 0189US6165656AOverlay error determination mark considering influence of aberrationMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Dec 26, 2000·112 cites·1 claims
- 0285US5939226AAberration estimation reticle for determining overlay errorMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Aug 17, 1999·78 cites·9 claims
- 0372US6239858B1Exposure method, exposure apparatus and semiconductor device manufactured by using the exposure apparatusMITSUBISHI ELECTRIC CORP·Filed 1999·Granted May 29, 2001·30 cites·10 claims
- 0466US6338925B1Photolithography processing based on fresh calibration parameter valuesMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Jan 15, 2002·9 cites·12 claims
- 0563US5792580AMethod of aligning reticle patternMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Aug 11, 1998·22 cites·2 claims
- 0660US6338971B1Method of correcting alignmentMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Jan 15, 2002·19 cites·17 claims
- 0757US5773180AMeasuring method of a relative positional deviation of reticle patternMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Jun 30, 1998·17 cites·6 claims
- 0842US5671165AMethod of determining position offset of a patternMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Sep 23, 1997·8 cites·10 claims
- 0937US6553137B1Method of increasing overlay accuracy in an exposure step and overlay displacement measuring device for determining optimum measurement focus plane by variation in magnitudes of displacement of two overlay inspection marksMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Apr 22, 2003·7 cites·10 claims
- 1036US2003104292A1Semiconductor device and fabrication method thereforMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
- 1135US5856054AMethod of alignment in exposure step through array error and shot error determinationsMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Jan 5, 1999·4 cites·4 claims
- 1234US6229618B1Method of improving registration accuracy and method of forming patterns on a substrate using the sameMITSUBISHI ELECTRIC CORP·Filed 1998·Granted May 8, 2001·3 cites·7 claims
- 1331US6662145B1Method, equipment, and recording medium for controlling exposure accuracyRENESAS TECH CORP·Filed 1999·Granted Dec 9, 2003·1 cites·4 claims
Join the waitlist — get patent alerts
Get an alert when Yoshikatu Tomimatu files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →