Inventor · disambiguated record
Yoshiko Tsumaru
Also filed as: TSUMARU YOSHIKO
5 granted patents·16 citations·filing 2003–2012
73Inventor score
Top patents by PatentIndex Score
5 records- 0174US7851128B2Photosensitive polymer composition, method of forming relief patterns, and electronic equipmentHITACHI CHEM DUPONT MICROSYS·Filed 2006·Granted Dec 14, 2010·3 cites·9 claims
- 0262US8304149B2Photosensitive polymer composition, method of forming relief patterns, and electronic equipmentNUNOMURA MASATAKA·Filed 2010·Granted Nov 6, 2012·1 cites·16 claims
- 0358US7150947B2Photosensitive polymer composition, method of forming relief patterns, and electronic equipmentHITACHI CHEM DUPONT MICROSYS·Filed 2003·Granted Dec 19, 2006·12 cites·14 claims
- 0452US8852726B2Photosensitive polymer composition, method of producing pattern and electronic partsOOE MASAYUKI·Filed 2012·Granted Oct 7, 2014·0 cites·10 claims
- 0538US8231959B2Photosensitive polymer composition, method of producing pattern and electronic partsOOE MASAYUKI·Filed 2004·Granted Jul 31, 2012·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →