Inventor · disambiguated record
Young Hwan Yang
Also filed as: YANG YOUNG HWAN
0 granted patents·7 pending applications·0 citations·filing 2020–2025
Top patents by PatentIndex Score
7 records- 0178US2025382699A1Method for preparing low-loss hydrogenated amorphous silicon that is transparent in visible light, method for preparing low-loss hydrogenated amorphous silicon nitride that is transparent in visible light, and method for preparing low-loss hydrogenated amorphous silicon oxide that is transparent in visible lightPOSTECH ACAD IND FOUND·Filed 2025·Application pending·0 cites
- 0278US2025389015A1Method for preparing low-loss hydrogenated amorphous silicon that is transparent in visible light, method for preparing low-loss hydrogenated amorphous silicon nitride that is transparent in visible light, and method for preparing low-loss hydrogenated amorphous silicon oxide that is transparent in visible lightPOSTECH ACAD IND FOUND·Filed 2025·Application pending·0 cites
- 0369US2025263835A1Method for preparing low-loss hydrogenated amorphous silicon that is transparent in visible light, method for preparing low-loss hydrogenated amorphous silicon nitride that is transparent in visible light, and method for preparing low-loss hydrogenated amorphous silicon oxide that is transparent in visible lightPOSTECH ACAD IND FOUND·Filed 2025·Application pending·0 cites
- 0448US2023135026A1Substrate processing apparatusSEMES CO LTD·Filed 2022·Application pending·0 cites
- 0545US2022172928A1Plasma processing apparatus and method for fabricating semiconductor device using the sameSEMES CO LTD·Filed 2021·Application pending·0 cites
- 0640US2023163003A1Substrate processing apparatus and process control method thereofSEMES CO LTD·Filed 2022·Application pending·0 cites
- 0738US2021066055A1Apparatus and method for treating substrateSEMES CO LTD·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →