Inventor · disambiguated record
Yong-Woon Yoon
Also filed as: YOON YONG SUNG · YOON YONG-WOON
13 granted patents·3 pending applications·12 citations·filing 2002–2019
85Inventor score
Top patents by PatentIndex Score
16 records- 0176US9665003B2Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2014·Granted May 30, 2017·3 cites·18 claims
- 0271US10312074B2Method of producing layer structure, layer structure, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 4, 2019·2 cites·31 claims
- 0371US9725389B2Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionCHEIL IND INC·Filed 2012·Granted Aug 8, 2017·2 cites·12 claims
- 0466US9359276B2Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask compositionCHOI YOO-JEONG·Filed 2012·Granted Jun 7, 2016·1 cites·10 claims
- 0566US9244351B2Composition for hardmask, method of forming patterns using the same, and semiconductor integrated circuit device including the patternsLEE SUNG-JAE·Filed 2012·Granted Jan 26, 2016·2 cites·12 claims
- 0665US9529257B2Hard mask composition and method for forming pattern using sameCHEIL IND INC·Filed 2013·Granted Dec 27, 2016·1 cites·15 claims
- 0763US9513546B2Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask compositionCHEIL IND INC·Filed 2013·Granted Dec 6, 2016·1 cites·13 claims
- 0854US9683114B2Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 20, 2017·0 cites·8 claims
- 0952US9823566B2Monomer, hardmask composition comprising monomer, and pattern forming method using hardmask compositionCHEIL IND INC·Filed 2013·Granted Nov 21, 2017·0 cites·20 claims
- 1049US2017327640A1Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2017·Application pending·0 cites
- 1142US2015187566A1Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 1240US11608471B2Composition for etching silicon nitride film and etching method using sameSAMSUNG SDI CO LTD·Filed 2019·Granted Mar 21, 2023·0 cites·16 claims
- 1338US10345706B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionSONG HYUN JI·Filed 2014·Granted Jul 9, 2019·0 cites·10 claims
- 1438US2003122133A1Semiconductor device using single carbon nanotube and method of manufacturing of the sameFiled 2002·Application pending·0 cites
- 1536US8900997B2Method for forming a dual damascene structure of a semiconductor device, and a semiconductor device therewithMOON JOON-YOUNG·Filed 2013·Granted Dec 2, 2014·0 cites·8 claims
- 1634US9371444B2Hardmask composition and method of forming patterns using the hardmask compositionSAMSUNG SDI CO LTD·Filed 2015·Granted Jun 21, 2016·0 cites·14 claims
Join the waitlist — get patent alerts
Get an alert when Yong-Woon Yoon files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →