Inventor · disambiguated record
Yukio Inazuki
Also filed as: INAZUKI YUKIO
100 granted patents·17 pending applications·475 citations·filing 1989–2025
99Inventor score
Files withSHINETSU CHEMICAL CO96INAZUKI YUKIO4YOSHIKAWA HIROKI4IGARASHI SHINICHI3ISHIKAWAJIMA MASTER METAL KK2
Top patents by PatentIndex Score
117 records- 0196US10078260B2Phase shift mask blank, phase shift mask, and blank preparing methodSHINETSU CHEMICAL CO·Filed 2016·Granted Sep 18, 2018·7 cites·13 claims
- 0296US7767366B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 3, 2010·34 cites·23 claims
- 0395US11624712B2Substrate defect inspection method and substrate defect inspection apparatusSHINETSU CHEMICAL CO·Filed 2021·Granted Apr 11, 2023·2 cites·18 claims
- 0495US8012654B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Sep 6, 2011·11 cites·22 claims
- 0594US8003284B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Aug 23, 2011·9 cites·23 claims
- 0693US10678125B2Photomask blank and method for preparing photomaskSHINETSU CHEMICAL CO·Filed 2017·Granted Jun 9, 2020·5 cites·20 claims
- 0792US9366951B2Halftone phase shift photomask blank, halftone phase shift photomask and pattern exposure methodSHINETSU CHEMICAL CO·Filed 2014·Granted Jun 14, 2016·8 cites·11 claims
- 0892US7736824B2Photomask blank, photomask, and method of manufactureSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 15, 2010·26 cites·11 claims
- 0991US6140210AMethod of fabricating an SOI wafer and SOI wafer fabricated therebySHINETSU HANDOTAI KK·Filed 1998·Granted Oct 31, 2000·111 cites·8 claims
- 1090US9645485B2Halftone phase shift photomask blank and making methodSHINETSU CHEMICAL CO·Filed 2015·Granted May 9, 2017·4 cites·4 claims
- 1190US7989124B2Photomask blank and photomask making methodTOPPAN PRINTING CO LTD·Filed 2010·Granted Aug 2, 2011·6 cites·19 claims
- 1289US10466582B2Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatusSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 5, 2019·2 cites·7 claims
- 1389US7767367B2Photomask blank and photomask making methodTOPPAN PRINTING CO LTD·Filed 2007·Granted Aug 3, 2010·10 cites·35 claims
- 1489US7691546B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2005·Granted Apr 6, 2010·10 cites·8 claims
- 1588US10564537B2Photomask blank, and preparation method thereofSHINETSU CHEMICAL CO·Filed 2017·Granted Feb 18, 2020·3 cites·10 claims
- 1687US9927695B2Halftone phase shift mask blank, halftone phase shift mask, and pattern exposure methodSHINETSU CHEMICAL CO·Filed 2016·Granted Mar 27, 2018·3 cites·5 claims
- 1787US7625676B2Photomask blank, photomask and fabrication method thereofSHINETSU CHEMICAL CO·Filed 2005·Granted Dec 1, 2009·13 cites·24 claims
- 1886US10545401B2Phase shift mask blank, phase shift mask, and blank preparing methodSHINETSU CHEMICAL CO·Filed 2018·Granted Jan 28, 2020·2 cites·24 claims
- 1986US10146122B2Halftone phase shift photomask blank and making methodSHINETSU CHEMICAL CO·Filed 2017·Granted Dec 4, 2018·2 cites·8 claims
- 2086US7790339B2Photomask blankSHINETSU CHEMICAL CO·Filed 2007·Granted Sep 7, 2010·8 cites·7 claims
- 2186US7618753B2Photomask blank, photomask and method for producing thoseSHINETSU CHEMICAL CO·Filed 2005·Granted Nov 17, 2009·8 cites·20 claims
- 2285US12050396B2Reflective mask blank, method of manufacturing thereof, and reflective maskSHINETSU CHEMICAL CO·Filed 2021·Granted Jul 30, 2024·1 cites·10 claims
- 2384US10466583B2Halftone phase shift mask blank and halftone phase shift maskSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 5, 2019·2 cites·15 claims
- 2483US10712654B2Photomask blankSHINETSU CHEMICAL CO·Filed 2018·Granted Jul 14, 2020·2 cites·22 claims
- 2583US8148036B2Photomask blank and photomaskINAZUKI YUKIO·Filed 2010·Granted Apr 3, 2012·4 cites·4 claims
- 2681US10809611B2Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatusSHINETSU CHEMICAL CO·Filed 2019·Granted Oct 20, 2020·1 cites·4 claims
- 2781US5007243AVessel for making high-purity fine particles of active metalsISHIKAWAJIMA MASTER METAL KK·Filed 1989·Granted Apr 16, 1991·34 cites·9 claims
- 2879US9488907B2Photomask blank, process for production of photomask, and chromium-containing material filmSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 8, 2016·1 cites·19 claims
- 2979US6362076B1Method of fabricating an SOI wafer by hydrogen ion delamination without independent bonding heat treatmentSHINETSU HANDOTAI KK·Filed 1999·Granted Mar 26, 2002·54 cites·5 claims
- 3077US10782608B2Method for preparing photomask blank, photomask blank, method for preparing photomask, photomask, and metallic chromium targetSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 22, 2020·1 cites·18 claims
- 3177US8007964B2Photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2010·Granted Aug 30, 2011·2 cites·17 claims
- 3275US2025383596A1Reflective photomask blank, reflective photomask and method for manufacturing reflective photomask blankSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 3374US8841048B2Photomask blank, photomask, and making methodINAZUKI YUKIO·Filed 2012·Granted Sep 23, 2014·3 cites·18 claims
- 3474US7195846B2Methods of manufacturing photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 27, 2007·13 cites·13 claims
- 3573US7622227B2Phase-shift photomask-blank, phase-shift photomask and fabrication method thereofSHINETSU CHEMICAL CO·Filed 2006·Granted Nov 24, 2009·3 cites·20 claims
- 3673US2024248388A1Substrate with Film for Reflective Mask Blank, and Reflective Mask BlankSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
- 3772US10670957B2Halftone phase shift photomask blank, making method, and halftone phase shift photomaskSHINETSU CHEMICAL CO·Filed 2017·Granted Jun 2, 2020·0 cites·10 claims
- 3872US9812300B2Silicon target for sputtering film formation and method for forming silicon-containing thin filmSHINETSU CHEMICAL CO·Filed 2014·Granted Nov 7, 2017·0 cites·9 claims
- 3972US8475978B2Photomask blank and making method, photomask, light pattern exposure method, and design method of transition metal/silicon base material filmYOSHIKAWA HIROKI·Filed 2011·Granted Jul 2, 2013·2 cites·16 claims
- 4072US7556892B2Halftone phase shift mask blank, halftone phase shift mask, and pattern transfer methodSHINETSU CHEMICAL CO·Filed 2005·Granted Jul 7, 2009·3 cites·28 claims
- 4171US10372030B2Halftone phase shift mask blank and halftone phase shift maskSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 6, 2019·1 cites·21 claims
- 4271US8920666B2Etching method and photomask blank processing methodIGARASHI SHINICHI·Filed 2010·Granted Dec 30, 2014·3 cites·12 claims
- 4371US8309277B2Photomask making methodIGARASHI SHINICHI·Filed 2010·Granted Nov 13, 2012·2 cites·19 claims
- 4471US7625677B2Half-tone stacked film, photomask-blank, photomask and fabrication method thereofSHINETSU CHEMICAL CO·Filed 2006·Granted Dec 1, 2009·3 cites·26 claims
- 4571US7419749B2Halftone phase shift mask blank, halftone phase shift mask and their preparationSHINETSU CHEMICAL CO·Filed 2005·Granted Sep 2, 2008·1 cites·12 claims
- 4670US9778559B2Method for preparing halftone phase shift photomask blankSHINETSU CHEMICAL CO·Filed 2016·Granted Oct 3, 2017·1 cites·6 claims
- 4769US8968972B2Photomask blank, process for production of photomask, and chromium-containing material filmYOSHIKAWA HIROKI·Filed 2011·Granted Mar 3, 2015·1 cites·20 claims
- 4868US2025138410A1Reflective photomask blank and method for manufacturing reflective photomask blankSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 4968US2025172862A1Reflective mask blank and manufacturing method thereofSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 5067US6503669B2Photomask blank, photomask and method of manufactureSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 7, 2003·8 cites·6 claims
Showing the top 50 of 117 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →