Inventor · disambiguated record
Yuko Kaimoto
Also filed as: KAIMOTO YUKO
12 granted patents·343 citations·filing 1992–2007
93Inventor score
Top patents by PatentIndex Score
12 records- 0194US6004720ARadiation sensitive material and method for forming patternFUJITSU LTD·Filed 1997·Granted Dec 21, 1999·53 cites·6 claims
- 0290US6344304B1Radiation sensitive material and method for forming patternFUJITSU LTD·Filed 1999·Granted Feb 5, 2002·38 cites·4 claims
- 0389US5585219AResist composition and process for forming resist patternFUJITSU LTD·Filed 1995·Granted Dec 17, 1996·96 cites·3 claims
- 0480US5585222AResist composition and process for forming resist patternFUJITSU LTD·Filed 1992·Granted Dec 17, 1996·42 cites·9 claims
- 0580US5443690APattern formation material and pattern formation methodFUJITSU LTD·Filed 1994·Granted Aug 22, 1995·45 cites·5 claims
- 0679US7465529B2Radiation sensitive material and method for forming patternFUJITSU LTD·Filed 2006·Granted Dec 16, 2008·3 cites·2 claims
- 0768US5506088AChemically amplified resist composition and process for forming resist pattern using sameFUJITSU LTD·Filed 1994·Granted Apr 9, 1996·23 cites·4 claims
- 0866US5660969AChemical amplification resist and a fabrication process of a semiconductor device that uses such a chemical amplification resistFUJITSU LTD·Filed 1996·Granted Aug 26, 1997·24 cites·10 claims
- 0959US6790589B2Radiation sensitive material and method for forming patternFUJITSU LTD·Filed 2001·Granted Sep 14, 2004·9 cites·16 claims
- 1044US7179580B2Radiation sensitive material and method for forming patternFUJITSU LTD·Filed 2004·Granted Feb 20, 2007·3 cites·4 claims
- 1140US7754619B2Method for forming a coating with a liquid, and method for manufacturing a semiconductor deviceFUJITSU MICROELECTRONICS LTD·Filed 2007·Granted Jul 13, 2010·0 cites·39 claims
- 1239US6120977APhotoresist with bleaching effectFUJITSU LTD·Filed 1996·Granted Sep 19, 2000·7 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →