Inventor · disambiguated record
Yuta Kanno
Also filed as: KANNO YUTA
25 granted patents·2 pending applications·58 citations·filing 2008–2019
93Inventor score
Files withNISSAN CHEMICAL IND LTD11NAKAJIMA MAKOTO6KANNO YUTA4NISSAN CHEMICAL CORP2SHIBAYAMA WATARU2
Top patents by PatentIndex Score
27 records- 0189US10081693B2Retardation material-forming resin composition, orientation material, and retardation materialNISSAN CHEMICAL IND LTD·Filed 2015·Granted Sep 25, 2018·3 cites·18 claims
- 0286US10590219B2Retardation material-forming resin composition, orientation material, and retardation materialNISSAN CHEMICAL IND LTD·Filed 2018·Granted Mar 17, 2020·2 cites·18 claims
- 0386US8426112B2Resist underlayer film forming composition containing polymer having nitrogen-containing silyl groupNAKAJIMA MAKOTO·Filed 2008·Granted Apr 23, 2013·9 cites·10 claims
- 0483US10100201B2Cured film formation composition, orientation material and retardation materialNISSAN CHEMICAL IND LTD·Filed 2015·Granted Oct 16, 2018·2 cites·10 claims
- 0583US8828879B2Silicon-containing composition having sulfonamide group for forming resist underlayer filmKANNO YUTA·Filed 2010·Granted Sep 9, 2014·4 cites·12 claims
- 0682US9023588B2Resist underlayer film forming composition containing silicon having nitrogen-containing ringNAKAJIMA MAKOTO·Filed 2011·Granted May 5, 2015·8 cites·16 claims
- 0781US8835093B2Resist underlayer film forming composition containing silicon having anion groupSHIBAYAMA WATARU·Filed 2009·Granted Sep 16, 2014·7 cites·9 claims
- 0881US8815494B2Resist underlayer film forming composition containing silicon having anion groupNISSAN CHEMICAL IND LTD·Filed 2012·Granted Aug 26, 2014·4 cites·2 claims
- 0979US10570248B2Cured film formation composition, orientation material, and retardation materialNISSAN CHEMICAL IND LTD·Filed 2016·Granted Feb 25, 2020·1 cites·9 claims
- 1079US8864894B2Resist underlayer film forming composition containing silicone having onium groupSHIBAYAMA WATARU·Filed 2009·Granted Oct 21, 2014·5 cites·15 claims
- 1178US9760006B2Silicon-containing resist underlayer film forming composition having urea groupNAKAJIMA MAKOTO·Filed 2009·Granted Sep 12, 2017·5 cites·9 claims
- 1271US8877425B2Silicon-containing resist underlayer film forming composition having fluorine-based additiveKANNO YUTA·Filed 2011·Granted Nov 4, 2014·3 cites·20 claims
- 1366US9196484B2Silicon-containing composition for formation of resist underlayer film, which contains organic group containing protected aliphatic alcoholTAKEDA SATOSHI·Filed 2011·Granted Nov 24, 2015·2 cites·7 claims
- 1463US10372039B2Resist underlayer film forming composition containing silicon having ester groupNISSAN CHEMICAL IND LTD·Filed 2013·Granted Aug 6, 2019·1 cites·10 claims
- 1561US9093279B2Thin film forming composition for lithography containing titanium and siliconNAKAJIMA MAKOTO·Filed 2012·Granted Jul 28, 2015·1 cites·18 claims
- 1660US9291900B2Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic groupKANNO YUTA·Filed 2012·Granted Mar 22, 2016·1 cites·12 claims
- 1748US11447700B2Liquid crystal cured layer, production method therefor, optical film, polarizing plate, and display deviceZEON CORP·Filed 2019·Granted Sep 20, 2022·0 cites·10 claims
- 1847US11392037B2Resist underlayer film forming composition containing silicone having cyclic amino groupNAKAJIMA MAKOTO·Filed 2009·Granted Jul 19, 2022·0 cites·15 claims
- 1943US10079146B2Resist underlayer film forming composition containing silicon containing cyclic organic group having hetero atomNISSAN CHEMICAL IND LTD·Filed 2013·Granted Sep 18, 2018·0 cites·16 claims
- 2043US9494862B2Resist underlayer film forming composition containing silicon having sulfone structure and amine structureNISSAN CHEMICAL IND LTD·Filed 2013·Granted Nov 15, 2016·0 cites·9 claims
- 2143US2021296588A1Charge transporting compositionNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 2242US11488824B2Method for manufacturing semiconductor device using silicon-containing resist underlayer film forming composition for solvent developmentNISSAN CHEMICAL IND LTD·Filed 2013·Granted Nov 1, 2022·0 cites·11 claims
- 2342US10428274B2Liquid crystal alignment agent for photo-alignment, aligning member, and retardation memberNISSAN CHEMICAL IND LTD·Filed 2016·Granted Oct 1, 2019·0 cites·6 claims
- 2442US9290623B2Composition for forming silicon-containing resist underlayer film having cyclic diester groupNISSAN CHEMICAL IND LTD·Filed 2013·Granted Mar 22, 2016·0 cites·15 claims
- 2540US9524871B2Silicon-containing resist underlayer film-forming composition having sulfone structureNAKAJIMA MAKOTO·Filed 2012·Granted Dec 20, 2016·0 cites·11 claims
- 2638US2020216696A1Non-aqueous ink compositionNISSAN CHEMICAL CORP·Filed 2018·Application pending·0 cites
- 2736US9217921B2Resist underlayer film forming composition containing silicon having sulfide bondKANNO YUTA·Filed 2010·Granted Dec 22, 2015·0 cites·15 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →