Inventor · disambiguated record
Yukiya Kawakami
Also filed as: KAWAKAMI YUKIYA
8 granted patents·2 pending applications·14 citations·filing 1999–2009
80Inventor score
Top patents by PatentIndex Score
10 records- 0169US7801709B2Simulation method using a simulation system that provides information on a transfer pattern of a predetermined mask pattern transferred to a wafer by optical photolithography and method of modifying mask patternNEC ELECTRONICS CORP·Filed 2007·Granted Sep 21, 2010·3 cites·5 claims
- 0264US7829246B2Method of forming patternNEC ELECTRONICS CORP·Filed 2006·Granted Nov 9, 2010·2 cites·13 claims
- 0360US8127257B2Designing method of photo-mask and method of manufacturing semiconductor device using the photo-maskKAWAKAMI YUKIYA·Filed 2009·Granted Feb 28, 2012·2 cites·20 claims
- 0450US6627476B2Solid state imaging device and method for manufacturing the sameNEC CORP·Filed 2001·Granted Sep 30, 2003·3 cites·16 claims
- 0543US6483132B2Charge coupled device with separate isolation regionNEC CORP·Filed 2001·Granted Nov 19, 2002·1 cites·4 claims
- 0642US2008145769A1Simulation method, simulation system, and method of correcting mask patternNEC ELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 0739US2008148218A1Mask data generation method, mask formation method, pattern formation methodNEC ELECTRONICS CORP·Filed 2007·Application pending·0 cites
- 0834US6555855B2Solid state imaging deviceNEC CORP·Filed 2000·Granted Apr 29, 2003·0 cites·19 claims
- 0930US6346722B1Solid state imaging device and method for manufacturing the sameNEC CORP·Filed 1999·Granted Feb 12, 2002·2 cites·10 claims
- 1028US6369414B2Charge coupled device having charge accumulating layer free from tow-dimensional effect under miniaturization and process for fabrication thereofNEC CORP·Filed 1999·Granted Apr 9, 2002·1 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →