Inventor · disambiguated record
Yukisato Kawamura
Also filed as: KAWAMURA YUKISATO
1 granted patent·2 pending applications·20 citations·filing 2000–2004
40Inventor score
Technology areasH01J
Files withNIKON CORP1
Top patents by PatentIndex Score
3 records- 0171US6528806B1Charged-particle-beam microlithography apparatus, reticles, and methods for reducing proximity effects, and device-manufacturing methods comprising sameNIKON CORP·Filed 2000·Granted Mar 4, 2003·20 cites·28 claims
- 0228US2004026634A1Electron beam proximity exposure apparatusFiled 2002·Application pending·0 cites
- 0323US2004149933A1Method and devices for adjusting an electron-beam used in an electron beam proximity exposure apparatusFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →