Inventor · disambiguated record
Yu-Kyung Kim
Also filed as: KIM YU-KYUNG
7 granted patents·4 pending applications·15 citations·filing 2004–2018
78Inventor score
Files withSAMSUNG ELECTRONICS CO LTD5KIM YU KYUNG2KWON DOO-WON1SAMSUNG DISPLAY CO LTD1SAMSUNG SDI CO LTD1
Top patents by PatentIndex Score
11 records- 0173US7354868B2Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixtureSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Apr 8, 2008·4 cites·16 claims
- 0268US9429771B2Eyeglasses including transparent display and controlling method thereofSAMSUNG DISPLAY CO LTD·Filed 2013·Granted Aug 30, 2016·6 cites·20 claims
- 0362US10684544B2Optical proximity correction (OPC) method and method of manufacturing mask by using the OPC methodSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Jun 16, 2020·1 cites·20 claims
- 0462US8092698B2Methods of forming semiconductor devices formed by processes including the use of specific etchant solutionsKIM YU-KYUNG·Filed 2008·Granted Jan 10, 2012·2 cites·11 claims
- 0561US7825030B2Method of forming a spacerSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Nov 2, 2010·1 cites·8 claims
- 0658US9370063B2LED driving device and lighting deviceSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jun 14, 2016·1 cites·20 claims
- 0755US2014034119A1Photoelectric deviceSAMSUNG SDI CO LTD·Filed 2012·Application pending·0 cites
- 0850US8058180B2Methods of fabricating a semiconductor device using a dilute aqueous solution of an ammonia and peroxide mixtureKWON DOO-WON·Filed 2008·Granted Nov 15, 2011·0 cites·15 claims
- 0947US2006028865A1Etchant solutions and methods of forming semiconductor devices formed by processes including the sameSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 1045US2012145232A1Solar cell having improved rear contactKIM YU KYUNG·Filed 2011·Application pending·0 cites
- 1138US2005074948A1Method of manufacturing shallow trench isolation structure using HF vapor etching processFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →