Inventor · disambiguated record
Yun-Yue Lin
Also filed as: LIN YUN-YUE
68 granted patents·12 pending applications·283 citations·filing 2007–2024
98Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD68SU WEI-FANG3LEE HSIN-CHANG2LIN YUN-YUE2TAIWAN SEMICONDUCTOR MFG2
Top patents by PatentIndex Score
80 records- 0198US8753788B1Apparatus of repairing a mask and a method for the sameTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Jun 17, 2014·87 cites·20 claims
- 0298US8679707B2Method of fabricating a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Mar 25, 2014·86 cites·20 claims
- 0397US12013632B2Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 18, 2024·2 cites·20 claims
- 0497US11846880B2Extreme ultraviolet mask and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Dec 19, 2023·2 cites·20 claims
- 0597US11782339B2Pellicle for an EUV lithography mask and a method of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 10, 2023·3 cites·20 claims
- 0697US11106127B2Structure of pellicle-mask structure with vent structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 31, 2021·9 cites·20 claims
- 0797US11016383B2Pellicle for an EUV lithography mask and a method of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted May 25, 2021·7 cites·20 claims
- 0896US12007685B2Method for forming structure of pellicle-mask structure with vent structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 11, 2024·2 cites·20 claims
- 0996US11762282B2Pellicle design for maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Sep 19, 2023·2 cites·20 claims
- 1096US11360376B2Extreme ultraviolet mask and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jun 14, 2022·3 cites·20 claims
- 1195US11143952B2Pellicle removal methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Oct 12, 2021·5 cites·20 claims
- 1295US10001701B1Pellicle structures and methods of fabricating thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 19, 2018·7 cites·20 claims
- 1395US9360749B2Pellicle structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Jun 7, 2016·10 cites·21 claims
- 1494US10962873B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Mar 30, 2021·4 cites·20 claims
- 1594US10162258B2Pellicle fabrication methods and structures thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 25, 2018·8 cites·20 claims
- 1693US11402745B2Mask for EUV lithography and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 2, 2022·2 cites·20 claims
- 1793US10534256B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jan 14, 2020·6 cites·19 claims
- 1893US9759997B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Sep 12, 2017·7 cites·20 claims
- 1991US11086215B2Extreme ultraviolet mask with reduced mask shadowing effect and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 10, 2021·4 cites·20 claims
- 2090US11294274B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Apr 5, 2022·2 cites·19 claims
- 2190US11143951B2Pellicle for an EUV lithography mask and a method of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Oct 12, 2021·4 cites·20 claims
- 2290US2025147405A1Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2389US12117725B2Pellicle for an EUV lithography mask and a method of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 15, 2024·1 cites·20 claims
- 2489US10670959B2Pellicle and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Jun 2, 2020·2 cites·17 claims
- 2589US2025076752A1Pellicle for euv lithography maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2689US2025264793A1Euv photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 2788US12429760B2Method for forming structure of pellicle-mask structure with vent structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Sep 30, 2025·0 cites·20 claims
- 2888US12210280B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Jan 28, 2025·0 cites·20 claims
- 2988US11789355B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 17, 2023·1 cites·20 claims
- 3087US12253796B2Extreme ultraviolet mask and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 18, 2025·0 cites·20 claims
- 3187US8916482B2Method of making a lithography maskLEE HSIN-CHANG·Filed 2012·Granted Dec 23, 2014·5 cites·12 claims
- 3286US12222639B2Extreme ultraviolet mask and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 11, 2025·0 cites·20 claims
- 3386US12174527B2Pellicle for an EUV lithography mask and a method of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
- 3486US9864270B2Pellicle and method for manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jan 9, 2018·3 cites·20 claims
- 3586US2024103358A1System and structure including a pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
- 3685US12253797B2Pellicle design for mask applicationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 18, 2025·0 cites·20 claims
- 3785US11506971B2Pellicle and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 22, 2022·1 cites·19 claims
- 3885US2024329517A1Pellicle having vent holeTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 3984US12055855B2Extreme ultraviolet lithography method using robust, high transmission pellicleTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Aug 6, 2024·0 cites·20 claims
- 4083US11886109B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 30, 2024·0 cites·20 claims
- 4183US11868041B2Pellicle and method of using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 9, 2024·0 cites·20 claims
- 4283US11454881B2Pellicle design for mask applicationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Sep 27, 2022·1 cites·20 claims
- 4382US10747103B2Pellicle fabrication methods and structures thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Aug 18, 2020·2 cites·20 claims
- 4481US10809613B2Mask for EUV lithography and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Oct 20, 2020·1 cites·20 claims
- 4580US12298662B2Mask for EUV lithography and method of manufacturing the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 13, 2025·0 cites·20 claims
- 4680US11656544B2Robust, high transmission pellicle for extreme ultraviolet lithography systemsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 23, 2023·0 cites·20 claims
- 4779US11914286B2Pellicle assembly and method for advanced lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 27, 2024·0 cites·20 claims
- 4879US2024377724A1Pellicle for an euv lithography mask and a method of manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 4977US12266525B2Photomask pellicle including network of nanowires and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Apr 1, 2025·0 cites·20 claims
- 5075US11500282B2EUV photo masks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 15, 2022·0 cites·20 claims
Showing the top 50 of 80 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →