Inventor · disambiguated record
Yunjun Lu
Also filed as: LU YUNJUN
9 granted patents·14 citations·filing 2015–2021
80Inventor score
Files withSHANGHAI INST OPTICS & FINE MECH CAS9
Top patents by PatentIndex Score
9 records- 0190US11604418B2Multi-channel device and method for measuring distortion and magnification of objective lensSHANGHAI INST OPTICS & FINE MECH CAS·Filed 2021·Granted Mar 14, 2023·2 cites·9 claims
- 0283US11009336B2Method for wavefront measurement of optical imaging system based on grating shearing interferometrySHANGHAI INST OPTICS & FINE MECH CAS·Filed 2019·Granted May 18, 2021·3 cites·2 claims
- 0383US9658114B1Device for measuring point diffraction interferometric wavefront aberration and method for detecting wave aberrationSHANGHAI INST OPTICS & FINE MECH CAS·Filed 2015·Granted May 23, 2017·5 cites·19 claims
- 0479US11215512B2Light intensity fluctuation-insensitive projection objective wave aberration detection device and detection method thereofSHANGHAI INST OPTICS & FINE MECH CAS·Filed 2020·Granted Jan 4, 2022·1 cites·7 claims
- 0579US11029611B2Device and method for detecting projection objective wave-front aberrationSHANGHAI INST OPTICS & FINE MECH CAS·Filed 2019·Granted Jun 8, 2021·2 cites·8 claims
- 0672US10969274B2Method for detecting wavefront aberration for optical imaging system based on grating shearing interferometerSHANGHAI INST OPTICS & FINE MECH CAS·Filed 2019·Granted Apr 6, 2021·1 cites·3 claims
- 0752US11561082B2Method for compensation during the process of wavefront reconstruction in grating-based lateral shearing interferometrySHANGHAI INST OPTICS & FINE MECH CAS·Filed 2021·Granted Jan 24, 2023·0 cites·6 claims
- 0850US11340118B2Method for high-accuracy wavefront measurement base on grating shearing interferometrySHANGHAI INST OPTICS & FINE MECH CAS·Filed 2021·Granted May 24, 2022·0 cites·3 claims
- 0948US11668625B2Apparatus and method for detecting wavefront aberration of objective lensSHANGHAI INST OPTICS & FINE MECH CAS·Filed 2021·Granted Jun 6, 2023·0 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →