Inventor · disambiguated record
Yukihiko Nakata
Also filed as: NAKATA YUKIHIKO
31 granted patents·12 pending applications·1,806 citations·filing 1977–2010
98Inventor score
Top patents by PatentIndex Score
43 records- 0198US7307028B2Film-forming method, method of manufacturing semiconductor device, semiconductor device, method of manufacturing display device, and display deviceADV LCD TECH DEV CT CO LTD·Filed 2004·Granted Dec 11, 2007·469 cites·7 claims
- 0298US4725740ADC-AC converting arrangement for photovoltaic systemSHARP KK·Filed 1985·Granted Feb 16, 1988·154 cites·4 claims
- 0395US6573163B2Method of optimizing channel characteristics using multiple masks to form laterally crystallized ELA poly-Si filmsSHARP LAB OF AMERICA INC·Filed 2001·Granted Jun 3, 2003·116 cites·21 claims
- 0495US6495405B2Method of optimizing channel characteristics using laterally-crystallized ELA poly-Si filmsSHARP LAB OF AMERICA INC·Filed 2001·Granted Dec 17, 2002·78 cites·5 claims
- 0594US6784455B2Single crystal TFT from continuous transition metal delivery methodSHARP LAB OF AMERICA INC·Filed 2002·Granted Aug 31, 2004·75 cites·11 claims
- 0694US5796116AThin-film semiconductor device including a semiconductor film with high field-effect mobilitySHARP KK·Filed 1995·Granted Aug 18, 1998·291 cites·7 claims
- 0793US6590228B2LCD device with optimized channel characteristicsSHARP LAB OF AMERICA INC·Filed 2002·Granted Jul 8, 2003·61 cites·4 claims
- 0892US6429097B1Method to sputter silicon filmsSHARP LAB OF AMERICA INC·Filed 2000·Granted Aug 6, 2002·51 cites·27 claims
- 0986US7728251B2Plasma processing apparatus with dielectric plates and fixing member wavelength dependent spacingSHARP KK·Filed 2005·Granted Jun 1, 2010·10 cites·9 claims
- 1086US6620661B2Single crystal TFT from continuous transition metal delivery methodSHARP LAB OF AMERICA INC·Filed 2002·Granted Sep 16, 2003·31 cites·29 claims
- 1186US6346437B1Single crystal TFT from continuous transition metal delivery methodSHARP LAB OF AMERICA INC·Filed 1998·Granted Feb 12, 2002·51 cites·32 claims
- 1285US5136351APhotovoltaic device with porous metal layerSHARP KK·Filed 1991·Granted Aug 4, 1992·64 cites·15 claims
- 1385US5071490ATandem stacked amorphous solar cell deviceSHARP KK·Filed 1990·Granted Dec 10, 1991·78 cites·15 claims
- 1483US8136479B2Plasma treatment apparatus and plasma treatment methodSUGAI HIDEO·Filed 2005·Granted Mar 20, 2012·11 cites·11 claims
- 1578US7311796B2Plasma processing apparatusEKISHO SENTAN GIJUTSU KAIHATSU·Filed 2003·Granted Dec 25, 2007·21 cites·8 claims
- 1678US6432804B1Sputtered silicon target for fabrication of polysilicon thin film transistorsSHARP LAB OF AMERICA INC·Filed 2000·Granted Aug 13, 2002·18 cites·26 claims
- 1776US6271062B1Thin film semiconductor device including a semiconductor film with high field-effect mobilitySHARP KK·Filed 1998·Granted Aug 7, 2001·47 cites·8 claims
- 1869US6396104B2Thin film transistor in metal-induced crystallized region formed around a transition metal nucleus siteSHARP LAB OF AMERICA INC·Filed 2001·Granted May 28, 2002·11 cites·3 claims
- 1968US5686349AFabrication of a thin film transistor and production of a liquid crystal display apparatusSHARP KK·Filed 1995·Granted Nov 11, 1997·35 cites·1 claims
- 2063US7446060B2Thin-film forming method using silane and an oxidizing gasADV LCD TECH DEV CT CO LTD·Filed 2007·Granted Nov 4, 2008·1 cites·2 claims
- 2162US6078059AFabrication of a thin film transistor and production of a liquid display apparatusSHARP KK·Filed 1997·Granted Jun 20, 2000·26 cites·6 claims
- 2261US6789499B2Apparatus to sputter silicon filmsSHARP LAB OF AMERICA INC·Filed 2002·Granted Sep 14, 2004·6 cites·4 claims
- 2359US6228693B1Selected site, metal-induced, continuous crystallization methodSHARP LAB OF AMERICA INC·Filed 1998·Granted May 8, 2001·20 cites·21 claims
- 2459US4714868ACharging and discharging control circuit for a storage batterySHARP KK·Filed 1985·Granted Dec 22, 1987·29 cites·6 claims
- 2558US6579425B2System and method for forming base coat and thin film layers by sequential sputter depositingSHARP LAB OF AMERICA INC·Filed 2001·Granted Jun 17, 2003·3 cites·30 claims
- 2657US6830965B1Semiconductor device and a method of creating the same utilizing metal induced crystallization while suppressing partial solid phase crystallizationSHARP LAB OF AMERICA INC·Filed 2000·Granted Dec 14, 2004·6 cites·15 claims
- 2757US5104455AAmorphous semiconductor solar cellSHARP KK·Filed 1991·Granted Apr 14, 1992·22 cites·9 claims
- 2857US4394601AZnS:Mn Thin-film electroluminescent element with memory functionSHARP KK·Filed 1977·Granted Jul 19, 1983·14 cites·3 claims
- 2957US2010239782A1Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatusADV LCD TECH DEV CT CO LTD·Filed 2010·Application pending·0 cites
- 3054US6620744B2Insulating film formation method, semiconductor device, and production apparatusSHARP KK·Filed 2002·Granted Sep 16, 2003·4 cites·22 claims
- 3154US2005205015A1Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatusSASAKI ATSUSHI·Filed 2005·Application pending·0 cites
- 3251US2009029507A1Dielectric film, its formation method, semiconductor device using the dielectric film and its production methodEKISHO SENTAN KK·Filed 2007·Application pending·0 cites
- 3348US6717178B2Semiconductor devices fabricated using sputtered silicon targetsSHARP LAB OF AMERICA INC·Filed 2002·Granted Apr 6, 2004·1 cites·10 claims
- 3448US2007034157A1Plasma processing apparatus and plasma processing methodNAKATA YUKIHIKO·Filed 2006·Application pending·0 cites
- 3548US2004107910A1Plasma processing apparatus and plasma processing methodFiled 2003·Application pending·0 cites
- 3645US6900083B2Method of forming multi-layers for a thin film transistorSHARP LAB OF AMERICA INC·Filed 2001·Granted May 31, 2005·2 cites·7 claims
- 3743US2008099447A1Plasma processing apparatus and plasma processing methodANDO MAKOTO·Filed 2006·Application pending·0 cites
- 3841US2004113227A1Dielectric film, its formation method, semiconductor device using the dielectric film and its production methodGOTO MASASHI·Filed 2003·Application pending·0 cites
- 3939US2005000446A1Plasma processing apparatus and plasma processing methodFiled 2004·Application pending·0 cites
- 4038US2004069612A1Substrate processing apparatus and substrate processing methodFiled 2003·Application pending·0 cites
- 4137US2005257891A1Plasma processing apparatusGOTO MASASHI·Filed 2003·Application pending·0 cites
- 4237US2003168004A1Manufacturing apparatus of an insulation filmFiled 2003·Application pending·0 cites
- 4332US2003127425A1System and method for etching resin with an ozone wet etching processFiled 2002·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Yukihiko Nakata files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →