Inventor · disambiguated record
Yutaka Ohmoto
Also filed as: OHMOTO YUTAKA
19 granted patents·5 pending applications·67 citations·filing 1994–2018
93Inventor score
Top patents by PatentIndex Score
24 records- 0189US9150967B2Plasma processing apparatus and sample stageWATANABE TOMOYUKI·Filed 2010·Granted Oct 6, 2015·7 cites·8 claims
- 0280US7608162B2Plasma processing apparatus and methodHITACHI LTD·Filed 2007·Granted Oct 27, 2009·4 cites·7 claims
- 0377US10141165B2Plasma processing apparatus and sample stage thereofHITACHI HIGH TECH CORP·Filed 2016·Granted Nov 27, 2018·2 cites·6 claims
- 0476US6759338B2Plasma processing apparatus and methodHITACHI LTD·Filed 2001·Granted Jul 6, 2004·9 cites·5 claims
- 0568US6649021B2Apparatus and method for plasma processing high-speed semiconductor circuits with increased yieldHITACHI LTD·Filed 2001·Granted Nov 18, 2003·9 cites·5 claims
- 0666US9384946B2Plasma processing apparatusSATO KOHEI·Filed 2012·Granted Jul 5, 2016·2 cites·5 claims
- 0758US10796890B2Plasma processing apparatus and sample stage thereofHITACHI HIGH TECH CORP·Filed 2018·Granted Oct 6, 2020·0 cites·7 claims
- 0857US7288166B2Plasma processing apparatusHITACHI LTD·Filed 2003·Granted Oct 30, 2007·6 cites·6 claims
- 0957US7009714B2Method of dry etching a sample and dry etching systemHITACHI HIGH TECH CORP·Filed 2003·Granted Mar 7, 2006·7 cites·18 claims
- 1055US8092637B2Manufacturing method in plasma processing apparatusKOUZUMA YUTAKA·Filed 2008·Granted Jan 10, 2012·1 cites·8 claims
- 1154US6867144B2Apparatus and method for plasma processing high-speed semiconductor circuits with increased yieldHITACHI LTD·Filed 2002·Granted Mar 15, 2005·3 cites·1 claims
- 1252US7396481B2Etching method of organic insulating filmHITACHI LTD·Filed 2005·Granted Jul 8, 2008·0 cites·12 claims
- 1352US7014787B2Etching method of organic insulating filmHITACHI LTD·Filed 2004·Granted Mar 21, 2006·2 cites·4 claims
- 1451US7122479B2Etching processing methodHITACHI HIGH TECH CORP·Filed 2002·Granted Oct 17, 2006·4 cites·10 claims
- 1551US6793833B2Etching method of organic insulating filmHITACHI LTD·Filed 2002·Granted Sep 21, 2004·2 cites·14 claims
- 1650US2014216657A1Plasma processing apparatus and sample stage thereofHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 1748US6413876B1Method for plasma processing high-speed semiconductor circuits with increased yieldHITACHI LTD·Filed 2001·Granted Jul 2, 2002·1 cites·3 claims
- 1846US2008236614A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2008·Application pending·0 cites
- 1946US2017025254A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Application pending·0 cites
- 2044US2008237184A1Method and apparatus for plasma processingYAKUSHIJI MAMORU·Filed 2007·Application pending·0 cites
- 2139US8282848B2Plasma processing method and plasma processing apparatusOHMOTO YUTAKA·Filed 2008·Granted Oct 9, 2012·0 cites·1 claims
- 2238US2005011612A1Plasma etching apparatus and plasma etching methodFiled 2004·Application pending·0 cites
- 2336US7026252B2Etching aftertreatment methodHITACHI HIGH TECH CORP·Filed 2003·Granted Apr 11, 2006·0 cites·4 claims
- 2436US6328845B1Plasma-processing method and an apparatus for carrying out the sameHITACHI LTD·Filed 1994·Granted Dec 11, 2001·8 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →