Inventor · disambiguated record
Yuta Shimada
Also filed as: SHIMADA YUTA
3 granted patents·8 pending applications·0 citations·filing 2022–2025
37Inventor score
Top patents by PatentIndex Score
11 records- 0163US2024167179A1Carbon dioxide electrolysis apparatusHONDA MOTOR CO LTD·Filed 2023·Application pending·0 cites
- 0263US2024167168A1Carbon dioxide electrolysis apparatusHONDA MOTOR CO LTD·Filed 2023·Application pending·0 cites
- 0362US2024332582A1Electrode structure for electrochemical cell, electrochemical cell, and electrochemical apparatusHONDA MOTOR CO LTD·Filed 2024·Application pending·0 cites
- 0461US11655549B2Carbon dioxide treatment apparatus, carbon dioxide treatment method, and method for producing carbon compoundHONDA MOTOR CO LTD·Filed 2022·Granted May 23, 2023·0 cites·20 claims
- 0559US12503778B2Electrochemical reaction device, method of reducing carbon dioxide, and method of producing carbon compoundsHONDA MOTOR CO LTD·Filed 2022·Granted Dec 23, 2025·0 cites·4 claims
- 0659US12338537B2Electrochemical reaction device, method for reducing carbon dioxide, and method for producing carbon compoundHONDA MOTOR CO LTD·Filed 2022·Granted Jun 24, 2025·0 cites·5 claims
- 0759US2022290318A1Electrochemical reaction deviceHONDA MOTOR CO LTD·Filed 2022·Application pending·0 cites
- 0852US2025297393A1Co2 conversion methodHONDA MOTOR CO LTD·Filed 2025·Application pending·0 cites
- 0951US2025122408A1Silica particles, production method therefor, silica sol, polishing composition, polishing method, method for producing semiconductor wafer, and method for producing semiconductor deviceMITSUBISHI CHEM CORP·Filed 2024·Application pending·0 cites
- 1051US2025197229A1Silica particles, production method therefor, silica sol, polishing composition, polishing method, method for producing semiconductor wafer, and method for producing semiconductor deviceMITSUBISHI CHEM CORP·Filed 2024·Application pending·0 cites
- 1149US2025297384A1Gas diffusion electrode and electrochemical reaction deviceMITSUI MINING & SMELTING CO LTD·Filed 2025·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →