Inventor · disambiguated record
Yuichiro Shindo
Also filed as: SHINDO YUICHIRO
50 granted patents·9 pending applications·579 citations·filing 1996–2014
98Inventor score
Files withJX NIPPON MINING & METALS CORP16SHINDO YUICHIRO16NIPPON MINING CO10JAPAN ENERGY CORP9NIKKO MATERIALS CO LTD5
Top patents by PatentIndex Score
59 records- 0193US6755948B1Titanium target for sputteringNIKKO MATERIALS CO LTD·Filed 2000·Granted Jun 29, 2004·34 cites·4 claims
- 0292US7435325B2Method for producing high purity nickle, high purity nickle, sputtering target comprising the high purity nickel, and thin film formed by using said spattering targetNIPPON MINING CO·Filed 2001·Granted Oct 14, 2008·46 cites·20 claims
- 0391US6896788B2Method of producing a higher-purity metalNIKKO MATERIALS CO LTD·Filed 2001·Granted May 24, 2005·47 cites·22 claims
- 0491US6485542B2Ni-Fe alloy sputtering target for forming magnetic thin films, magnetic thin film, and method of manufacturing the Ni-Fe alloy sputtering targetJAPAN ENERGY CORP·Filed 2001·Granted Nov 26, 2002·35 cites·2 claims
- 0590US8012335B2Method for collection of valuable metal from ITO scrapJX NIPPON MINING & METALS CORP·Filed 2007·Granted Sep 6, 2011·12 cites·6 claims
- 0690US8007652B2Method for collection of valuable metal from ITO scrapJX NIPPON MINING & METALS CORP·Filed 2007·Granted Aug 30, 2011·12 cites·3 claims
- 0790US7674441B2Highly pure hafnium material, target and thin film comprising the same and method for producing highly pure hafniumNIPPON MINING CO·Filed 2009·Granted Mar 9, 2010·6 cites·18 claims
- 0890US7484546B2Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the targetNIPPON MINING CO·Filed 2006·Granted Feb 3, 2009·9 cites·17 claims
- 0989US9340850B2Process for producing high-purity tinJX NIPPON MINING & METALS CORP·Filed 2014·Granted May 17, 2016·4 cites·2 claims
- 1089US8012337B2Method for collection of valuable metal from ITO scrapJX NIPPON MINING & METALS CORP·Filed 2007·Granted Sep 6, 2011·12 cites·3 claims
- 1189US8012336B2Method for collection of valuable metal from ITO scrapJX NIPPON MINING & METALS CORP·Filed 2007·Granted Sep 6, 2011·12 cites·14 claims
- 1289US8003065B2Method for collection of valuable metal from ITO scrapJX NIPPON MINING & METALS CORP·Filed 2007·Granted Aug 23, 2011·12 cites·6 claims
- 1388US8216442B2Ultrahigh-purity copper and process for producing the sameSHINDO YUICHIRO·Filed 2010·Granted Jul 10, 2012·9 cites·8 claims
- 1488US7510635B2High purity zinc oxide powder and method for production thereof, and high purity zinc oxide target and thin film of high purity zinc oxideNIPPON MINING CO·Filed 2004·Granted Mar 31, 2009·22 cites·20 claims
- 1584US6036741AProcess for producing high-purity rutheniumJAPAN ENERGY CORP·Filed 1998·Granted Mar 14, 2000·59 cites·12 claims
- 1683US7578965B2High-purity Ru powder, sputtering target obtained by sintering the same, thin film obtained by sputtering the target and process for producing high-purity Ru powderNIPPON MINING CO·Filed 2005·Granted Aug 25, 2009·8 cites·14 claims
- 1783US6458182B2Process for producing high-purity Mn materialsJAPAN ENERGY CORP·Filed 2000·Granted Oct 1, 2002·14 cites·4 claims
- 1882US8308934B2Method of recovering valuable metals from IZO scrapSHINDO YUICHIRO·Filed 2008·Granted Nov 13, 2012·4 cites·20 claims
- 1982US8192596B2Ultrahigh-purity copper and process for producing the sameSHINDO YUICHIRO·Filed 2005·Granted Jun 5, 2012·9 cites·6 claims
- 2082US7959782B2Method of manufacturing a Ni-Pt alloyJX NIPPON MINING & METALS CORP·Filed 2010·Granted Jun 14, 2011·5 cites·7 claims
- 2182US7156964B2Sputtering target for phase-change memory, film for phase change memory formed by using the target, and method for producing the targetNIPPON MINING CO·Filed 2002·Granted Jan 2, 2007·20 cites·2 claims
- 2281US8685226B2Method of recovering valuable metal from scrap containing conductive oxideSHINDO YUICHIRO·Filed 2008·Granted Apr 1, 2014·3 cites·12 claims
- 2380US8668785B2High purity ytterbium, sputtering target made thereof, thin film containing the same, and method of producing the sameSHINDO YUICHIRO·Filed 2008·Granted Mar 11, 2014·4 cites·4 claims
- 2478US7871564B2High-purity Ru alloy target, process for producing the same, and sputtered filmJX NIPPON MINING & METALS CORP·Filed 2006·Granted Jan 18, 2011·5 cites·5 claims
- 2577US8308933B2Method of recovering valuable metals from IZO scrapSHINDO YUICHIRO·Filed 2009·Granted Nov 13, 2012·2 cites·3 claims
- 2676US6861030B2Method of manufacturing high purity zirconium and hafniumNIKKO MATERIALS CO LTD·Filed 2001·Granted Mar 1, 2005·23 cites·20 claims
- 2775US9476134B2High purity copper and method of producing high purity copper based on electrolysisJX NIPPON MINING & METALS CORP·Filed 2013·Granted Oct 25, 2016·1 cites·4 claims
- 2875US8152864B2Method for production of high purity copper sulfateSHINDO YUICHIRO·Filed 2010·Granted Apr 10, 2012·1 cites·8 claims
- 2975US5667665AProcess of producing high purity cobaltJAPAN ENERGY CORP·Filed 1996·Granted Sep 16, 1997·35 cites·11 claims
- 3073US10161032B2High-purity titanium ingots, manufacturing method therefor, and titanium sputtering targetJX NIPPON MINING & METALS CORP·Filed 2013·Granted Dec 25, 2018·1 cites·11 claims
- 3173US6267827B1Ni-Fe alloy sputtering target for forming magnetic thin films, magnetic thin film, and method of manufacturing the Ni-Fe alloy sputtering targetJAPAN ENERGY CORP·Filed 1999·Granted Jul 31, 2001·21 cites·8 claims
- 3272US9972428B2Neodymium-based rare earth permanent magnet and process for producing sameSHINDO YUICHIRO·Filed 2012·Granted May 15, 2018·2 cites·16 claims
- 3372US8308932B2Method of recovering valuable metals from IZO scrapSHINDO YUICHIRO·Filed 2009·Granted Nov 13, 2012·2 cites·4 claims
- 3472US6284013B1Method for preparing high-purity ruthenium sputtering target and high-purity ruthenium sputtering targetJAPAN ENERGY CORP·Filed 1999·Granted Sep 4, 2001·33 cites·6 claims
- 3571US6270593B1Mn alloy materials for magnetic materials, Mn alloy sputtering targets, and magnetic thin filmsJAPAN ENERGY CORP·Filed 1998·Granted Aug 7, 2001·21 cites·6 claims
- 3670US9441289B2High-purity copper or high-purity copper alloy sputtering target, process for manufacturing the sputtering target, and high-purity copper or high-purity copper alloy sputtered filmFUKUSHIMA ATSUSHI·Filed 2009·Granted Sep 13, 2016·1 cites·5 claims
- 3765US7964070B2Highly pure hafnium material, target thin film comprising the same and method for producing highly pure hafniumJX NIPPON MINING & METALS CORP·Filed 2004·Granted Jun 21, 2011·3 cites·8 claims
- 3864US7887603B2High purity copper sulfate and method for production thereofJX NIPPON MINING & METALS CORP·Filed 2003·Granted Feb 15, 2011·4 cites·17 claims
- 3963US2011123389A1High Purity Copper and Method of Producing High Purity Copper Based on ElectrolysisJX NIPPON MINING & METALS CORP·Filed 2009·Application pending·0 cites
- 4062US7938918B2High-purity Ni-V alloy, target therefrom, high-purity Ni-V alloy thin film and process for producing high-purity Ni-V alloyJX NIPPON MINING & METALS CORP·Filed 2010·Granted May 10, 2011·0 cites·6 claims
- 4162US2009004498A1Manufacturing Method of High Purity Nickel, High Purity Nickel, Sputtering Target formed from said High Purity Nickel, and Thin Film formed with said Sputtering TargetNIPPON MINING CO·Filed 2008·Application pending·0 cites
- 4261US7695527B2High purity copper sulfate and method for production thereofNIPPON MINING CO·Filed 2004·Granted Apr 13, 2010·4 cites·15 claims
- 4360US5810983AHigh purity cobalt sputtering targetsJAPAN ENERGY CORP·Filed 1997·Granted Sep 22, 1998·17 cites·2 claims
- 4459US8980169B2High-purity lanthanum, sputtering target comprising high-purity lanthanum, and metal gate film mainly comprising high-purity lanthanumTAKAHATA MASAHIRO·Filed 2008·Granted Mar 17, 2015·1 cites·8 claims
- 4557US8685225B2Method of recovering valuable metal from scrap conductive oxideSHINDO YUICHIRO·Filed 2008·Granted Apr 1, 2014·0 cites·7 claims
- 4657US8449845B2Zirconium crucibleSHINDO YUICHIRO·Filed 2008·Granted May 28, 2013·0 cites·15 claims
- 4756US2009098012A1High-Purity Tin or Tin Alloy and Process for Producing High-Purity TinNIPPON MINING CO·Filed 2006·Application pending·0 cites
- 4854US8585995B2High purity ZrB2 powder and manufacturing method thereofSHINDO YUICHIRO·Filed 2005·Granted Nov 19, 2013·0 cites·18 claims
- 4952US8734633B2Method of recovering valuable metal from scrap containing conductive oxideSHINDO YUICHIRO·Filed 2008·Granted May 27, 2014·0 cites·19 claims
- 5051US8871144B2High-purity Ni-V alloy target therefrom high-purity Ni-V alloy thin film and process for producing high-purity Ni-V alloySHINDO YUICHIRO·Filed 2004·Granted Oct 28, 2014·0 cites·10 claims
Showing the top 50 of 59 patent records by PatentIndex Score.
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