Inventor · disambiguated record
Yuzo Tasaki
Also filed as: TASAKI YUZO
12 granted patents·3 pending applications·176 citations·filing 1997–2010
92Inventor score
Top patents by PatentIndex Score
15 records- 0193US5904771AMethod of subliming material in CVD film preparation methodDOWA MINING CO·Filed 1997·Granted May 18, 1999·106 cites·8 claims
- 0289US7960901B2Piezoelectric device having a ferroelectric film including a ferroelectric materialSEIKO EPSON CORP·Filed 2010·Granted Jun 14, 2011·6 cites·8 claims
- 0386US7323257B2Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and elementSEIKO EPSON CORP·Filed 2005·Granted Jan 29, 2008·6 cites·16 claims
- 0481US7008669B2Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and elementSEIKO EPSON CORP·Filed 2002·Granted Mar 7, 2006·14 cites·25 claims
- 0572US7956519B2Piezoelectric device having a ferroelectric film including a solid solutionSEIKO EPSON CORP·Filed 2010·Granted Jun 7, 2011·1 cites·8 claims
- 0668US7205056B2Ceramic film and method of manufacturing the same, ferroelectric capacitor, semiconductor device, and other elementSEIKO EPSON CORP·Filed 2002·Granted Apr 17, 2007·6 cites·7 claims
- 0768US6602344B2Ceramic film and method of manufacturing the same, semiconductor device, and piezoelectric deviceSEIKO EPSON CORP·Filed 2001·Granted Aug 5, 2003·10 cites·46 claims
- 0861US7825569B2Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and elementSEIKO EPSON CORP·Filed 2009·Granted Nov 2, 2010·0 cites·7 claims
- 0957US2008159939A1Ceramic and method of manufacturing the same, dielectric capacitor, semiconductor device, and elementSEIKO EPSON CORP·Filed 2007·Application pending·0 cites
- 1052US2006051601A1Ceramic film and method of manufacturing the same, ferroelectric capacitor, semiconductor device, and other elementSEIKO EPSON CORP·Filed 2005·Application pending·0 cites
- 1150US7138013B2Ceramic film and method of manufacturing the same, semiconductor device, and piezoelectric deviceSEIKO EPSON CORP·Filed 2003·Granted Nov 21, 2006·2 cites·6 claims
- 1250US6149975APotassium-containing thin film and process for producing the sameDOWA MINING CO·Filed 1999·Granted Nov 21, 2000·14 cites·2 claims
- 1345US5952047ACVD precursors and film preparation method using the sameDOWA MINING CO·Filed 1998·Granted Sep 14, 1999·9 cites·5 claims
- 1437US2005147754A1Zirconium complex useful in a CVD method and a thin film preparation method using the complexTOSHIMA MFG CO LTD·Filed 2005·Application pending·0 cites
- 1532US6037485ACVD precursors and film preparation method using the sameDOWA MINING CO·Filed 1999·Granted Mar 14, 2000·2 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →