Inventor · disambiguated record
Yuri Tolmachev
Also filed as: TOLMACHEV YURI · TOLMACHEV YURI N · TOLMACHEV YURI NIKOLAEVICH
10 granted patents·7 pending applications·332 citations·filing 2002–2009
90Inventor score
Top patents by PatentIndex Score
17 records- 0196US7252716B2Gas injection apparatus for semiconductor processing systemSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Aug 7, 2007·234 cites·20 claims
- 0288US8169148B2Plasma generating apparatusJEON SANG JEAN·Filed 2008·Granted May 1, 2012·21 cites·21 claims
- 0383US7355357B2Plasma acceleratorSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Apr 8, 2008·14 cites·14 claims
- 0483US7210424B2High-density plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 1, 2007·21 cites·17 claims
- 0576US7381292B2Inductively coupled plasma generating apparatus incorporating serpentine coil antennaSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 3, 2008·12 cites·24 claims
- 0674US7404879B2Ionized physical vapor deposition apparatus using helical self-resonant coilSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 29, 2008·11 cites·34 claims
- 0772US6835919B2Inductively coupled plasma systemSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Dec 28, 2004·12 cites·22 claims
- 0858US7052583B2Magnetron cathode and magnetron sputtering apparatus comprising the sameSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 30, 2006·3 cites·17 claims
- 0950US2010065215A1Plasma generating apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2009·Application pending·0 cites
- 1047US7740738B2Inductively coupled antenna and plasma processing apparatus using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 22, 2010·4 cites·20 claims
- 1142US2008289576A1Plasma based ion implantation systemSAMSUNG ELECTRONICS CO LTD·Filed 2008·Application pending·0 cites
- 1241US2008023653A1Plasma based ion implantation apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 1341US2005170668A1Plasma chemical vapor deposition system and method for coating both sides of substrateSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 1439US7804250B2Apparatus and method to generate plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 28, 2010·0 cites·36 claims
- 1539US2005173069A1Plasma generating apparatus and plasma processing apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2004·Application pending·0 cites
- 1638US2008032427A1Ion analysis system based on analyzer of ion energy distribution using retarded electric fieldSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1738US2007114903A1Multi-channel plasma acceleratorSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →