Inventor · disambiguated record
Yuki Usui
Also filed as: USUI YUKI
17 granted patents·15 pending applications·12 citations·filing 2010–2023
88Inventor score
Files withNISSAN CHEMICAL CORP17NISSAN CHEMICAL IND LTD6KISHIOKA TAKAHIRO2UMEZAKI MAKIKO2KIMURA SHIGEO1
Top patents by PatentIndex Score
32 records- 0179US9101158B2Application of soybean emulsion composition to soybean-derived raw material-containing food or beverageSAMOTO MASAHIKO·Filed 2012·Granted Aug 11, 2015·2 cites·13 claims
- 0278US10437151B2Cationically polymerizable resist underlayer film-forming compositionNISSAN CHEMICAL IND LTD·Filed 2016·Granted Oct 8, 2019·1 cites·9 claims
- 0372US9023583B2Monolayer or multilayer forming compositionKISHIOKA TAKAHIRO·Filed 2011·Granted May 5, 2015·2 cites·7 claims
- 0471US9793131B2Pattern forming method using resist underlayer filmNISSAN CHEMICAL IND LTD·Filed 2014·Granted Oct 17, 2017·2 cites·8 claims
- 0570US8685615B2Photosensitive resist underlayer film forming compositionKIMURA SHIGEO·Filed 2010·Granted Apr 1, 2014·2 cites·12 claims
- 0669US2025215256A1Polymer film-forming composition and selective polymer film-forming methodNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 0768US9678427B2Resist underlayer film-forming composition containing copolymer that has triazine ring and sulfur atom in main chainNISSAN CHEMICAL IND LTD·Filed 2014·Granted Jun 13, 2017·1 cites·6 claims
- 0867US11003078B2Compositions for forming a protective film against basic aqueous hydrogen peroxide solution, and pattern formation methodNISSAN CHEMICAL CORP·Filed 2017·Granted May 11, 2021·1 cites·10 claims
- 0965US11542366B2Composition for forming resist underlayer film and method for forming resist pattern using sameNISSAN CHEMICAL IND LTD·Filed 2020·Granted Jan 3, 2023·0 cites·3 claims
- 1060US2025002685A1Thermosetting compositionNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1155US9514949B2Composition for forming organic hard mask layer for use in lithography containing polymer having acrylamide structureSOMEYA YASUNOBU·Filed 2012·Granted Dec 6, 2016·1 cites·14 claims
- 1255US2025361419A1Composition for forming coating film for removing foreign matters and semiconductor substrateNISSAN CHEMICAL CORP·Filed 2023·Application pending·0 cites
- 1351US11319514B2Composition for forming a coating film for removing foreign mattersNISSAN CHEMICAL CORP·Filed 2018·Granted May 3, 2022·0 cites·14 claims
- 1451US10844167B2Composition for forming resist underlayer film and method for forming resist pattern using sameNISSAN CHEMICAL IND LTD·Filed 2017·Granted Nov 24, 2020·0 cites·3 claims
- 1551US2024352281A1Method of manufacturing laminate and kit of adhesive compositionsNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1651US2024363387A1Method of manufacturing laminate and kit of adhesive compositionsNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 1750US11655273B2Substrates coated with selective cell separation or cell culture polymersNATIONAL UNIV CORPORATION UNIV OF TOYAMA·Filed 2018·Granted May 23, 2023·0 cites·11 claims
- 1849US9140989B2Photosensitive organic particlesKISHIOKA TAKAHIRO·Filed 2012·Granted Sep 22, 2015·0 cites·12 claims
- 1949US2025092292A1Adhesive composition, laminate, method for producing laminate, and method for producing processed substrateNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2048US2025084291A1Adhesive composition, laminate, and method for producing processed semiconductor substrateNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2148US2023250314A1Composition for forming a coating film for removing foreign mattersNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2246US2020041905A1Resist underlying film-forming composition containing an amide group-containing polyesterNISSAN CHEMICAL CORP·Filed 2017·Application pending·0 cites
- 2346US2024199918A1Adhesive composition, laminate, method of manufacturing laminate, and method of manufacturing processed substrateNISSAN CHEMICAL CORP·Filed 2022·Application pending·0 cites
- 2445US2023343629A1Laminate and release agent compositionNISSAN CHEMICAL CORP·Filed 2021·Application pending·0 cites
- 2544US11131928B2Resist underlayer film forming composition which contains compound having glycoluril skeleton as additiveNISSAN CHEMICAL CORP·Filed 2017·Granted Sep 28, 2021·0 cites·14 claims
- 2641US9822330B2Light-degradable material, substrate, and method for patterning the substrateNISSAN CHEMICAL IND LTD·Filed 2013·Granted Nov 21, 2017·0 cites·18 claims
- 2740US9340561B2Organic silicon compound and silane coupling agent containing the sameUMEZAKI MAKIKO·Filed 2012·Granted May 17, 2016·0 cites·11 claims
- 2840US2020192224A1Resist underlayer film-forming compositionNISSAN CHEMICAL CORP·Filed 2018·Application pending·0 cites
- 2938US2020347226A1Resin composition for insulating filmNISSAN CHEMICAL CORP·Filed 2019·Application pending·0 cites
- 3037US2020201183A1Resist underlayer film forming composition containing compound having hydantoin ringNISSAN CHEMICAL CORP·Filed 2017·Application pending·0 cites
- 3129US9320602B2Compressed fiber structural material and method for producing the sameNAKAYAMA NOBORU·Filed 2012·Granted Apr 26, 2016·0 cites·5 claims
- 3229US2012288795A1Composition for formation of photosensitive resist underlayer film and method for formation of resist patternUMEZAKI MAKIKO·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →