Inventor · disambiguated record
Yu Yanase
Also filed as: YANASE YU
30 granted patents·11 pending applications·46 citations·filing 2015–2024
95Inventor score
Files withSHINETSU CHEMICAL CO41
Top patents by PatentIndex Score
41 records- 0198US11480870B2Pellicle frame, pellicle, and method for pelling pellicleSHINETSU CHEMICAL CO·Filed 2021·Granted Oct 25, 2022·5 cites·29 claims
- 0298US11422457B2PellicleSHINETSU CHEMICAL CO·Filed 2021·Granted Aug 23, 2022·4 cites·18 claims
- 0398US11397379B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 26, 2022·5 cites·27 claims
- 0498US11199768B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2020·Granted Dec 14, 2021·5 cites·18 claims
- 0597US11237476B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2020·Granted Feb 1, 2022·4 cites·9 claims
- 0697US10935882B2Pellicle frame, pellicle, and method for pelling pellicleSHINETSU CHEMICAL CO·Filed 2018·Granted Mar 2, 2021·7 cites·20 claims
- 0797US10859909B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2018·Granted Dec 8, 2020·5 cites·21 claims
- 0896US11592739B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2021·Granted Feb 28, 2023·2 cites·10 claims
- 0996US11054738B2PellicleSHINETSU CHEMICAL CO·Filed 2019·Granted Jul 6, 2021·4 cites·5 claims
- 1095US11971655B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Apr 30, 2024·1 cites·13 claims
- 1194US11774847B2PellicleSHINETSU CHEMICAL CO·Filed 2022·Granted Oct 3, 2023·1 cites·12 claims
- 1292US2025053078A1Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1391US2025068055A1PellicleSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
- 1489US12306532B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2024·Granted May 20, 2025·0 cites·12 claims
- 1588US12164223B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Dec 10, 2024·0 cites·30 claims
- 1688US12164222B2Pellicle frame, pellicle, and method for peeling pellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Dec 10, 2024·0 cites·20 claims
- 1788US12158697B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Dec 3, 2024·0 cites·27 claims
- 1888US12158696B2Pellicle frame, pellicle, and method for peeling pellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Dec 3, 2024·0 cites·32 claims
- 1988US12153340B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Nov 26, 2024·0 cites·27 claims
- 2088US12085847B2PellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Sep 10, 2024·0 cites·20 claims
- 2188US12050400B2Pellicle frame, pellicle, and method for peeling pellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Jul 30, 2024·0 cites·21 claims
- 2288US12038686B2Pellicle frame, pellicle, and method for peeling pellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Jul 16, 2024·0 cites·26 claims
- 2387US12164224B2PellicleSHINETSU CHEMICAL CO·Filed 2023·Granted Dec 10, 2024·0 cites·16 claims
- 2483US11796908B2Pellicle frame, pellicle, and method for peeling pellicleSHINETSU CHEMICAL CO·Filed 2022·Granted Oct 24, 2023·0 cites·18 claims
- 2583US11782340B2Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2022·Granted Oct 10, 2023·0 cites·16 claims
- 2678USD1078834SPellicle frameSHINETSU CHEMICAL CO·Filed 2021·Granted Jun 10, 2025·0 cites·1 claims
- 2776US10353283B2Adhesive for pellicle, pellicle, and method of selecting adhesive for pellicleSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 16, 2019·1 cites·7 claims
- 2872US10053367B2Method of manufacturing graphene film and method of manufacturing pellicle using the sameSHINETSU CHEMICAL CO·Filed 2017·Granted Aug 21, 2018·1 cites·3 claims
- 2972US9910349B2Agglutinant for pellicle and a pellicle using itSHINETSU CHEMICAL CO·Filed 2016·Granted Mar 6, 2018·1 cites·8 claims
- 3061US2025224668A1Pellicle frame and pellicleSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 3160US2024192586A1Pellicle Frame Laminate and Method for Manufacturing Pellicle Using Said LaminateSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 3259US2024337921A1Pellicle for exposure capable of easy adjustment of atmospheric pressureSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 3359US2024353750A1Exposure pellicle capable of adjusting atmospheric pressure at high speedSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 3458US10761421B2Pellicle film for photolithography and pellicleSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 1, 2020·0 cites·12 claims
- 3557US10712658B2Method of procuring an agglutinant structure and a method of manufacturing a pellicle including said agglutinant procuring methodSHINETSU CHEMICAL CO·Filed 2018·Granted Jul 14, 2020·0 cites·20 claims
- 3655US2023221634A1Pellicle Frame, Pellicle, Exposure Original Plate with Pellicle, Exposure Method, and Method for Manufacturing Semiconductor, and Method for Manufacturing Liquid Crystal Display BoardSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 3755US2023213850A1Pellicle Frame, Pellicle, Pellicle-Equipped Exposure Original Plate, Exposure Method, Method for Manufacturing Semiconductor, and Method for Manufacturing Liquid Crystal Display BoardSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 3855US2023236497A1Pellicle Frame, Pellicle, Pellicle-Attached Exposure Original Plate, Method for Manufacturing Semiconductor, Method for Manufacturing Liquid Crystal Display Plate, and Exposure MethodSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 3952US9703188B2Agglutinat for pellicle, a pellicle using it and a method for evaluating pellicleSHINETSU CHEMICAL CO·Filed 2015·Granted Jul 11, 2017·0 cites·13 claims
- 4048US2023135575A1Pellicle Frame, Pellicle, Exposure Original Plate with Pellicle and Exposure Method, and Method for Manufacturing Semiconductor Device or Liquid Crystal Display BoardSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
- 4145US2020192216A1Pellicle Film for Photolithography and Pellicle Provided with the SameSHINETSU CHEMICAL CO·Filed 2019·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →