Inventor · disambiguated record
Zhiyue Geng
Also filed as: GENG ZHIYUE
0 granted patents·4 pending applications·0 citations·filing 2021–2024
Top patents by PatentIndex Score
4 records- 0169US2024248401A1Resin and 193 nm dry photoresist containing same, and preparation method therefor and use thereofSHANGHAI SINYANG SEMICONDUCTOR MAT CO LTD·Filed 2024·Application pending·0 cites
- 0256US2024351979A1Polyonium salt photoacid generator for arf light source dry lithography, preparation method therefor and application thereofSHANGHAI SINYANG SEMICONDUCTOR MAT CO LTD·Filed 2021·Application pending·0 cites
- 0354US2025013149A1Additive for 193 nm dry photoresist and preparation method for and application of additiveSHANGHAI SINYANG SEMICONDUCTOR MAT CO LTD·Filed 2021·Application pending·0 cites
- 0448US2025021002A1Bottom anti-reflective coating for deep ultraviolet lithography, preparation method therefor and use thereofSHANGHAI SINYANG SEMICONDUCTOR MAT CO LTD·Filed 2021·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →