Inventor · disambiguated record
Zhibiao Mao
Also filed as: MAO ZHIBIAO
11 granted patents·3 pending applications·145 citations·filing 1999–2022
90Inventor score
Files withSHIPLEY CO LLC6SHANGHAI HUALI MICROELECT CORP3NINGBO NATA OPTO ELECTRONIC MAT CO LTD2DAI YUNQING1MAO ZHIBIAO1
Top patents by PatentIndex Score
14 records- 0188US6692888B1Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 1999·Granted Feb 17, 2004·56 cites·24 claims
- 0285US6492086B1Phenolic/alicyclic copolymers and photoresistsSHIPLEY CO LLC·Filed 1999·Granted Dec 10, 2002·46 cites·2 claims
- 0381US8518825B1Method to manufacture trench-first copper interconnectionMAO ZHIBIAO·Filed 2012·Granted Aug 27, 2013·8 cites·9 claims
- 0475US6849381B2Copolymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2003·Granted Feb 1, 2005·12 cites·20 claims
- 0573US8823936B2Structure for critical dimension and overlay measurementDAI YUNQING·Filed 2012·Granted Sep 2, 2014·4 cites·7 claims
- 0670US7700256B2Phenolic/alicyclic copolymers and photoresistsROHM & HAAS ELECT MAT·Filed 2002·Granted Apr 20, 2010·8 cites·15 claims
- 0763US9171731B2Method of forming the gate with the LELE double patternSHANGHAI HUALI MICROELECT CORP·Filed 2013·Granted Oct 27, 2015·2 cites·7 claims
- 0862US6777157B1Copolymers and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2000·Granted Aug 17, 2004·6 cites·15 claims
- 0956US2022234985A1Diester structure monomer, preparation method therefor, and application thereofNINGBO NATA OPTO ELECTRONIC MAT CO LTD·Filed 2022·Application pending·0 cites
- 1054US2022267492A1Modified film-forming resin containing acid inhibitor, preparation method therefor, and photoresist compositionNINGBO NATA OPTO ELECTRONIC MAT CO LTD·Filed 2022·Application pending·0 cites
- 1150US7183037B2Antireflective coatings with increased etch ratesSHIPLEY CO LLC·Filed 2001·Granted Feb 27, 2007·2 cites·42 claims
- 1249US7090968B2Copolymers having nitrile and alicyclic leaving groups and photoresist compositions comprising sameSHIPLEY CO LLC·Filed 2003·Granted Aug 15, 2006·1 cites·16 claims
- 1342US2014273465A1Method of forming dual gate oxideSHANGHAI HUALI MICROELECT CORP·Filed 2013·Application pending·0 cites
- 1437US8962494B2Method of manufacturing dual gate oxide devicesSHANGHAI HUALI MICROELECT CORP·Filed 2013·Granted Feb 24, 2015·0 cites·13 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →