Inventor · name-matched record
CHANG HUICHENG
7 granted patents·2 pending applications·0 citations·filing 2020–2025
70Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD9
This identity is grouped by exact name match (no disambiguated inventor record was available for these filings) — it may combine same-named inventors.
Top patents by PatentIndex Score
9 records- 0192US2026075867A1Semiconductor device and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0286US2026096125A1Method of manufacturing semiconductor devices having metal gate structure and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0379US12557623B2Semiconductor device with connecting structure having a doped layer and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 17, 2026·0 cites·20 claims
- 0478US12538567B2Semiconductor structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jan 27, 2026·0 cites·20 claims
- 0577US12557602B2Wafer positioning method and apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Granted Feb 17, 2026·0 cites·20 claims
- 0673US12557612B2Bonding system with sealing gasket and method for using the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Granted Feb 17, 2026·0 cites·20 claims
- 0768US12527019B2Method of manufacturing semiconductor devices having metal gate structure and semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 13, 2026·0 cites·20 claims
- 0860US12563997B2Warm wafer after ion cryo-implantationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Feb 24, 2026·0 cites·20 claims
- 0960US12527070B2Method for forming wells for semiconductor devices using implanations of increasing energyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 13, 2026·0 cites·20 claims
Join the waitlist — get patent alerts
Get an alert when CHANG HUICHENG files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: exact name match across USPTO filings. How scoring works →