Inventor · name-matched record
KUSAMA SATOSHI
0 granted patents·12 pending applications·0 citations·filing 2025–2025
Technology areasG03F
Files withSHINETSU CHEMICAL CO12
This identity is grouped by exact name match (no disambiguated inventor record was available for these filings) — it may combine same-named inventors.
Top patents by PatentIndex Score
12 records- 0178US2026093175A1Resist composition, laminate, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0276US2026063993A1Resist composition, laminate, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0376US2026056472A1Laminate, process for manufacturing laminate, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0473US2026056467A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0573US2026056463A1Hypervalent bismuth compound, resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0673US2026036903A1Method for manufacturing non-chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0773US2026035589A1Method for manufacturing non-chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0872US2026016751A1Laminate, preparation of laminate and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0971US2026029715A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1071US2026028503A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1170US2026010075A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1265US2026044073A1Negative resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
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Identity basis: exact name match across USPTO filings. How scoring works →