Inventor · name-matched record
LEE HSIN-CHANG
9 granted patents·4 pending applications·0 citations·filing 2021–2025
74Inventor score
Files withTAIWAN SEMICONDUCTOR MFG CO LTD13
This identity is grouped by exact name match (no disambiguated inventor record was available for these filings) — it may combine same-named inventors.
Top patents by PatentIndex Score
13 records- 0192US2026072344A1Euv pellicle and mounting method thereof on photo maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0282US2026086449A1Methods to improve mechanical properties of pellicle membraneTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0376US12517423B2Extreme ultraviolet mask with alloy based absorbersTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Jan 6, 2026·0 cites·20 claims
- 0471US12578270B2Mask characterization methodsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 17, 2026·0 cites·20 claims
- 0569US12517424B2Methods to improve mechanical properties of pellicle membraneTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 6, 2026·0 cites·20 claims
- 0667US12557609B2Methods for dry printing carbon nanotube membranesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 17, 2026·0 cites·20 claims
- 0766US2026093171A1Euv photomasks and manufacturing method thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
- 0865US2026072340A1Amorphous capping layer structure for lithography mask blankTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
- 0964US12578640B2Photosensitive material for photoresist and lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 17, 2026·0 cites·20 claims
- 1062US12535740B2Interstitial type absorber for extreme ultraviolet maskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 27, 2026·0 cites·20 claims
- 1162US12523929B2Methods for removing catalyst particles from nanotube filmsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 13, 2026·0 cites·20 claims
- 1261US12578652B2Photomask and methods for measuring and manufacturing the photomaskTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 17, 2026·0 cites·20 claims
- 1361US12554191B2Pellicle membrane and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Feb 17, 2026·0 cites·20 claims
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Identity basis: exact name match across USPTO filings. How scoring works →