Inventor · name-matched record

LIN CHIN-HSIANG

9 granted patents·2 pending applications·0 citations·filing 2021–2025

74Inventor score

Files withTAIWAN SEMICONDUCTOR MFG CO LTD11

This identity is grouped by exact name match (no disambiguated inventor record was available for these filings) — it may combine same-named inventors.

Top patents by PatentIndex Score

11 records

0197US2026076154A1Method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
0282US2026086449A1Methods to improve mechanical properties of pellicle membraneTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
0379US12566384B2Method for mask data synthesis with wafer target adjustmentTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Mar 3, 2026·0 cites·20 claims
0476US12541149B2Resist dispensing system and method of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 3, 2026·0 cites·20 claims
0571US12550685B2Protective composition and method of forming photoresist patternTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 10, 2026·0 cites·20 claims
0669US12517424B2Methods to improve mechanical properties of pellicle membraneTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 6, 2026·0 cites·20 claims
0764US12517437B2Photolithography method and apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 6, 2026·0 cites·20 claims
0862US12523929B2Methods for removing catalyst particles from nanotube filmsTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jan 13, 2026·0 cites·20 claims
0960US12578645B2Method of manufacturing a semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Mar 17, 2026·0 cites·20 claims
1053US12566374B2Photoresist composition and method of manufacturing semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 3, 2026·0 cites·20 claims
1150US12535738B2Photoresist top coating material for etching rate controlTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jan 27, 2026·0 cites·20 claims

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Identity basis: exact name match across USPTO filings. How scoring works →