Inventor · name-matched record
OHASHI MASAKI
2 granted patents·13 pending applications·0 citations·filing 2022–2025
21Inventor score
Files withSHINETSU CHEMICAL CO15
This identity is grouped by exact name match (no disambiguated inventor record was available for these filings) — it may combine same-named inventors.
Top patents by PatentIndex Score
15 records- 0178US2026093175A1Resist composition, laminate, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0278US2026050214A1Molecular resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0376US2026063993A1Resist composition, laminate, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0476US2026056472A1Laminate, process for manufacturing laminate, and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0573US2026056467A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0673US2026056463A1Hypervalent bismuth compound, resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0773US2026036903A1Method for manufacturing non-chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0873US2026035589A1Method for manufacturing non-chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 0972US2026016751A1Laminate, preparation of laminate and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1071US2026029715A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1171US2026028503A1Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1270US2026010075A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1365US2026044073A1Negative resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1462US12523932B2Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Granted Jan 13, 2026·0 cites·15 claims
- 1559US12535733B2Molecular resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2022·Granted Jan 27, 2026·0 cites·17 claims
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Identity basis: exact name match across USPTO filings. How scoring works →