Anti-reflective film having superb optical characteristics

Abstract

An anti-reflective film having a stacked structure including a transparent substrate, a high refraction layer and a low refraction layer, and more specifically, the low refraction layer may include, as a binder, a siloxane compound synthesized by reacting alkoxysilane and organosilane having a fluoroalkyl group.

The invention claimed is: 
     
       1. An anti-reflective film having a stack structure of a transparent substrate, a high refractive-index layer, and a low refractive-index layer, wherein the low refractive-index layer comprises: a binder formed by polymerization of a silane compound represented by Formula 1 with an organosilane compound represented by Formula 2; and hollow silica particles,
   R 1   x Si(OR 2 ) 4-x   [Formula 1]
 
 where R 1  is a C 1  to C 10  alkyl group, a C 6  to C 10  aryl group, or a C 3  to C 10  alkenyl group; R 2  is a C 1  to C 6  alkyl group; and x is an integer satisfying 0≤x<4,
   R 3   y Si(OR 4 ) 4-y   [Formula 2]
 
 
 where R 3  is a C 1  to C 12  fluoroalkyl group; R 4  is a C 1  to C 6  alkyl group; and y is an integer satisfying 0≤y<4, 
 wherein the anti-reflective film has a water contact angle of about 40° to about 70°, 
 wherein the anti-reflective film has a reflectance ranging from about 0.08% to about 0.45%, and 
 wherein the anti-reflective film reflects light having color value of a* and b* in CIE L*a*b* color space of 1.3410≤a*≤1.97 and −0.9978≤b*≤−0.85, respectively, when irradiated with white light. 
 
     
     
       2. The anti-reflective film according to  claim 1 , wherein the silane compound represented by Formula 1 comprises at least one compound selected from the group consisting of tetramethoxysilane, tetraethoxysilane, tetrapropoxysilane, tetraisopropoxysilane, tetra-n-butoxysilane, tetra-sec-butoxysilane, tetra-tert-butoxysilane, trimethoxysilane, triethoxysilane, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, propyltriethoxysilane, isobutyltriethoxysilane, cyclohexyltrimethoxysilane, phenyltrimethoxysilane, phenyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, allyltrimethoxysilane allyltriethoxysilane, dimethyldimethoxysilane, dimethyldiethoxysilane, diphenyldimethoxysilane, diphenyldiethoxysilane, and combinations thereof. 
     
     
       3. The anti-reflective film according to  claim 1 , wherein the organosilane compound represented by Formula 2 comprises at least one compound selected from the group consisting of trifluoromethyltrimethoxysilane, trifluoromethyltriethoxysilane, trifluoropropyltrimethoxysilane, trifluoropropyltriethoxysilane, nonafluorobutylethyltrimethoxysilane, nonafluorobutylethyltriethoxysilane, nonafluorohexyltrimethoxysilane, nonafluorohexyltriethoxysilane, tridecafluorooctyltrimethoxysilane, tridecafluorooctyltriethoxysilane, heptadecafluorodecyltrimethoxysilane, heptadecafluorodecyltriethoxysilane, and combinations thereof. 
     
     
       4. The anti-reflective film according to  claim 1 , wherein the hollow silica particles have a number average diameter of 1 nm to 1,000 nm. 
     
     
       5. The anti-reflective film according to  claim 1 , wherein the binder is present in an amount of 10 parts by weight to 120 parts by weight based on 100 parts by weight of the hollow silica particles. 
     
     
       6. The anti-reflective film according to  claim 1 , wherein the low refractive-index layer has an index of refraction of 1.2 to 1.25. 
     
     
       7. The anti-reflective film according to  claim 1 , wherein the low refractive-index layer has a thickness of 50 nm to 150 nm. 
     
     
       8. The anti-reflective film according to  claim 1 , wherein the high refractive-index layer has an index of refraction of 1.6 to 1.7. 
     
     
       9. The anti-reflective film according to  claim 1 , wherein the high refractive-index layer has a thickness of 100 nm to 500 nm.