Touch substrate and manufacturing method for the same, and display device

Abstract

Embodiments of the present disclosure provide a touch substrate and a manufacturing method for the same, and a display device. The touch substrate includes a base, and a white photoresist, a first flat layer, a first metal electrode layer, a second flat layer, and a second metal electrode layer sequentially formed on the base. The white photoresist is formed in a frame region of the touch substrate. The first flat layer is configured to cover the white photoresist and the base, so as to provide a flat surface for forming the first metal electrode layer. The display device includes the touch substrate and a display panel bonded thereto. In embodiments of the present disclosure, the height difference brought about by the white photoresist is planarized through the first flat layer, thereby avoiding the problem of disconnected wire in a metal electrode layer at the climbing position in the frame region.

What is claimed is: 
     
       1. A touch substrate comprising:
 a base; and 
 a white photoresist, a first flat layer, a first metal electrode layer, a second flat layer, and a second metal electrode layer sequentially formed on the base, wherein the white photoresist is formed in a frame region of the touch substrate, and wherein the first flat layer is configured to cover the white photoresist and the base to provide a flat surface for forming the first metal electrode layer; 
 wherein the first metal electrode layer comprises a plurality of first metal electrode lines, wherein the second metal electrode layer comprises a plurality of second metal electrode lines, and wherein the plurality of first metal electrode lines and the plurality of second metal electrode lines are crossed; 
 wherein the first metal electrode layer comprises a first light-shield region in the frame region parallel to an extending direction of the first metal electrode lines; 
 wherein the second metal electrode layer comprises a second light-shield region in the frame region parallel to an extending direction of the second metal electrode lines; 
 wherein the first metal electrode layer comprises a first wiring region in the frame region perpendicular to an extending direction of the first metal electrode lines, and wherein the first metal electrode lines are connected to the first wiring region; 
 wherein the second metal electrode layer comprises a second wiring region in the frame region perpendicular to an extending direction of the second metal electrode lines, and wherein the second metal electrode lines are connected to the second wiring region; 
 wherein the first wiring region is provided at two ends of the first metal electrode lines, and the first light-shield region is provided at two sides of the first metal electrode lines; and 
 wherein the second wiring region is provided at two ends of the second metal electrode lines, and the second light-shield region is provided at two sides of the second metal electrode lines. 
 
     
     
       2. The touch substrate according to  claim 1 , wherein the first metal electrode layer is black. 
     
     
       3. The touch substrate according to  claim 1 , wherein the second metal electrode layer is black. 
     
     
       4. The touch substrate according to  claim 1 , wherein the first flat layer and the second flat layer are formed of a transparent insulating material. 
     
     
       5. A display device comprising the touch substrate according to  claim 1  and a display panel bonded to the touch substrate. 
     
     
       6. A manufacturing method for a touch substrate comprising:
 forming a base; 
 forming a white photoresist, a first flat layer, a first metal electrode layer, a second flat layer, and a second metal electrode layer on the base sequentially, wherein the white photoresist is formed in a frame region of the touch substrate, and wherein the first flat layer is configured to cover the white photoresist and the base to provide a flat surface for forming the first metal electrode layer; 
 forming a plurality of first metal electrode lines in the first metal electrode layer; 
 forming a plurality of second metal electrode lines in the second metal electrode layer, wherein the plurality of first metal electrode lines and the plurality of second metal electrode lines are crossed; 
 forming, in the first metal electrode layer, a first light-shield region in the frame region parallel to an extending direction of the first metal electrode lines; 
 forming, in the second metal electrode layer, a second light-shield region in the frame region parallel to an extending direction of the second metal electrode lines; 
 forming, in the first metal electrode layer, a first wiring region in the frame region perpendicular to an extending direction of the first metal electrode lines; and 
 connecting the first metal electrode lines to the first wiring region; 
 forming, in the second metal electrode layer, a second wiring region in the frame region perpendicular to an extending direction of the second metal electrode lines; and 
 connecting the second metal electrode lines to the second wiring region; 
 wherein the first wiring region is provided at two ends of the first metal electrode lines, and the first light-shield region is provided at two sides of the first metal electrode lines; and 
 wherein the second wiring region is provided at two ends of the second metal electrode lines, and the second light-shield region is provided at two sides of the second metal electrode lines. 
 
     
     
       7. The method according to  claim 6 , wherein the first metal electrode layer is black. 
     
     
       8. The method according to  claim 6 , wherein the second metal electrode layer is black. 
     
     
       9. The method according to  claim 6 , wherein the first flat layer and the second flat layer are formed of a transparent insulating material.