In-cell touch liquid crystal display device and method for fabricating the same

Abstract

An in-cell touch LCD in one example includes a lower array substrate; an upper array substrate having an area greater than the lower array substrate; gate and data lines and a thin film transistor on the inner surface of the upper array substrate; a planarization layer on the inner surface of the upper array substrate, and exposing a part of a drain electrode; a common electrode on the planarization layer; a passivation layer on the planarization layer and exposing the part of the drain electrode; a touch line on the passivation layer; an inter-layered insulating layer on the passivation layer, covering the touch line, and exposing the part of the drain electrode, the touch line and the common electrode; a plurality of pixel electrodes on the inter-layered insulating layer, overlapping the common electrode, and connected to the drain electrode; and a connection line connecting the touch line and the pixel electrodes.

What is claimed is: 
     
       1. An in-cell touch liquid crystal display device, comprising:
 a lower array substrate; 
 an upper array substrate that is on and faces the lower array substrate, and has an area greater than an area of the lower array substrate; 
 a gate line and a data line that are on an inner surface of the upper array substrate and cross each other to define a pixel region; 
 a thin film transistor on the inner surface of the upper array substrate; 
 a planarization layer that is on the inner surface of the upper array substrate having the thin film transistor, and exposes a part of a drain electrode of the thin film transistor; 
 a common electrode on the planarization layer; 
 a passivation layer that is on the planarization layer and exposes the part of the drain electrode; 
 a touch line on the passivation layer; 
 an inter-layered insulating layer that is on the passivation layer, covers the touch line, and exposes the part of the drain electrode, the touch line and the common electrode; 
 a plurality of pixel electrodes that are on the inter-layered insulating layer, overlap the common electrode, and are connected to the drain electrode; and 
 a connection line connecting the touch line and the common electrode. 
 
     
     
       2. The in-cell touch liquid crystal display device of  claim 1 , further comprising:
 a nitride insulating layer that is below the gate line and a gate electrode, and on the inner surface of the upper array substrate. 
 
     
     
       3. The in-cell touch liquid crystal display device of  claim 1 , wherein the common electrode is formed in a large-sized plate shape. 
     
     
       4. The in-cell touch liquid crystal display device of  claim 1 , wherein the common electrode is formed over a substantially entire surface of the pixel region. 
     
     
       5. The in-cell touch liquid crystal display device of  claim 1 , further comprising:
 a transparent conductive layer on an outer surface of the lower array substrate. 
 
     
     
       6. The in-cell touch liquid crystal display device of  claim 1 , wherein the lower array substrate is a color filter array substrate, and the upper array substrate is a thin film transistor array substrate. 
     
     
       7. The in-cell touch liquid crystal display device of  claim 1 , wherein an electrostatic discharge path is produced through the common electrode, an Ag dot portion that is formed at side portions of the upper array substrate and the lower array substrate, and a ground line. 
     
     
       8. A method for fabricating an in-cell touch liquid crystal display device, the method comprising:
 providing a lower array substrate, and an upper array substrate that is on and faces the lower array substrate, wherein the upper array substrate has an area greater than an area of the lower array substrate; 
 forming a gate line and a data line that are on an inner surface of the upper array substrate and cross each other to define a pixel region; 
 forming a thin film transistor on the inner surface of the upper array substrate; 
 forming a planarization layer that is on the inner surface of the upper array substrate having the thin film transistor, and exposes a part of a drain electrode of the thin film transistor; 
 forming a common electrode on the planarization layer; 
 forming a passivation layer that is on the planarization layer and exposes the part of the drain electrode; 
 forming a touch line on the passivation layer; 
 forming an inter-layered insulating layer that is on the passivation layer, covers the touch line, and exposes the part of the drain electrode, the touch line and the common electrode; and 
 forming a plurality of pixel electrodes that are on the inter-layered insulating layer, overlap the common electrode, and are connected to the drain electrode, and a connection line connecting the touch line and the common electrode. 
 
     
     
       9. The method of  claim 8 , further comprising:
 forming a nitride insulating layer that is below the gate line and a gate electrode, and on the inner surface of the upper array substrate. 
 
     
     
       10. The method of  claim 8 , wherein the common electrode is formed in a large-sized plate shape. 
     
     
       11. The method of  claim 8 , wherein the common electrode is formed over a substantially entire surface of the pixel region. 
     
     
       12. The method of  claim 8 , further comprising:
 forming a transparent conductive layer on an outer surface of the lower array substrate. 
 
     
     
       13. The method of  claim 8 , wherein the lower array substrate is a color filter array substrate, and the upper array substrate is a thin film transistor array substrate. 
     
     
       14. The method of  claim 8 , wherein an electrostatic discharge path is produced through the common electrode, an Ag dot portion that is formed at side portions of the upper array substrate and the lower array substrate, and a ground line.