Mask plate, method for manufacturing mask plate, and usage of mask plate in manufacturing display substrate

Abstract

A mask plate, a method for manufacturing the mask plate and a usage of the mask plate in manufacturing a display substrate are provided. The mask plate includes a transparent substrate and at least two layers of electrochromic thin film patterns arranged on the transparent substrate. Each of the at least two layers of electrochromic thin film patterns is configured to be capable of being switched between a light-transmissible state and a non-light-transmissible state under an effect of an electric field. The mask plate is capable of forming at least two different mask patterns on the display substrate, which reduces the number of mask plates required for manufacturing the display substrate.

What is claimed is: 
     
       1. A mask plate, comprising:
 a transparent substrate; and 
 at least two layers of electrochromic thin film patterns arranged on the transparent substrate, wherein each of the at least two layers of electrochromic thin film patterns is configured to be capable of being switched between a light-transmissible state and a non-light-transmissible state under an effect of an electric field, 
 transparent electrodes arranged at two sides of each of the at least two layers of electrochromic thin film patterns, wherein the transparent electrodes are configured to apply the electric field to each of the at least two layers of electrochromic thin film patterns, 
 wherein each of the transparent electrodes is continuously extended on a whole layer 
 wherein the at least two layers of electrochromic thin film patterns are arranged at a same side of the transparent substrate, 
 wherein a lower transparent electrode, a first electrochromic thin film pattern, a common transparent electrode, a second electrochromic thin film pattern and an upper transparent electrode are arranged sequentially at the same side of the transparent substrate, and the common transparent electrode is configured to be applied with a voltage less than a voltage applied to the lower transparent electrode and less than a voltage applied to the upper transparent electrode. 
 
     
     
       2. The mask plate according to  claim 1 , wherein at least one layer of electrochromic thin film pattern is formed at each of two sides of the transparent substrate. 
     
     
       3. The mask plate according to  claim 2 , wherein a first lower transparent electrode, a first electrochromic thin film pattern and a first upper transparent electrode are arranged sequentially at one of the two sides of the transparent substrate, and a second lower transparent electrode, a second electrochromic thin film pattern and a second upper transparent electrode are arranged sequentially at the other one of the two sides of the transparent substrate. 
     
     
       4. The mask plate according to  claim 1 , wherein each of the at least two layers of electrochromic thin film patterns comprises a upper transparent electrode arranged at one side of the layer of electrochromic thin film pattern, and a lower transparent electrode arranged at the other side of the layer of electrochromic thin film pattern, the mask plate further comprises a plurality of transparent insulation layers, and each of the transparent insulation layers is arranged between a lower transparent electrode of one layer of electrochromic thin film pattern and a upper transparent electrode of another layer of electrochromic thin film pattern adjacent to the one layer of electrochromic thin film pattern. 
     
     
       5. The mask plate according to  claim 4 , wherein a first upper transparent electrode, a first electrochromic thin film pattern, a first lower transparent electrode, a first transparent insulation layer, a second upper transparent electrode, a second electrochromic thin film pattern, a second lower transparent electrode, a second transparent insulation layer, a third upper transparent electrode, a third electrochromic thin film pattern and a third lower transparent electrode are arranged sequentially at the same side of the transparent substrate. 
     
     
       6. The mask plate according to  claim 1 , wherein each of the at least two layers of electrochromic thin film patterns comprises at least two electrochromic thin film units spaced apart from each other, and a gap between the at least two electrochromic thin film units is filled with a transparent insulation material. 
     
     
       7. The mask plate according to  claim 1 , further comprising:
 a control module arranged at a periphery of the transparent substrate and electrically connected to transparent electrodes of each of the at least two layers of electrochromic thin film patterns, wherein the control module is configured to control a voltage applied across each of the at least two layers of electrochromic thin film patterns. 
 
     
     
       8. The mask plate according to  claim 1 , wherein the electrochromic thin film patterns are made of Prussian blue. 
     
     
       9. The mask plate according to  claim 6 , wherein the transparent insulation material is silicon oxide, silicon nitride or silicon oxynitride. 
     
     
       10. The mask plate according to  claim 1 , wherein orthogonal projections of the at least two layers of electrochromic thin film patterns on the transparent substrate are different from each other. 
     
     
       11. A method for manufacturing the mask plate according to  claim 1 , comprising:
 providing the transparent substrate; and 
 forming the at least two layers of electrochromic thin film patterns on the transparent substrate, wherein each of the at least two layers of electrochromic thin film patterns is configured to be capable of being switched between the light-transmissible state and the non-light-transmissible state under the effect of the electric field. 
 
     
     
       12. The method according to  claim 11 , wherein forming the at least two layers of electrochromic thin film patterns on the transparent substrate comprises:
 forming a lower transparent electrode, a first electrochromic thin film pattern, a common transparent electrode, a second electrochromic thin film pattern and a upper transparent electrode sequentially at one side of the transparent substrate. 
 
     
     
       13. The method according to  claim 11 , wherein forming the at least two layers of electrochromic thin film patterns on the transparent substrate comprises:
 forming a first upper transparent electrode, a first electrochromic thin film pattern, a first lower transparent electrode, a first transparent insulation layer, a second upper transparent electrode, a second electrochromic thin film pattern, a second lower transparent electrode, a second transparent insulation layer, a third upper transparent electrode, a third electrochromic thin film pattern and a third lower transparent electrode sequentially at one side of the transparent substrate.