Seed flow chamber for seed conditioning, processing, and drying in a treatment system
Abstract
A seed flow chamber for handling seed and grain commodity, especially for use with a seed treatment applicator. Seed flow is received through an upper inlet opening configured to receive a flow of seed and discharged through a lower discharge opening. A diverging guide member splits the seed flow. A converging guide member disposed below the diverging guide member reunites the seed flow prior to discharge. The converging member has a downward sloping surface and an air vent, such as a plurality of airflow apertures connected to a plenum. The air vent is configured to communicate with an air supply. A vacuum vent—disposed below the diverging guide member—is configured to communicate with a vacuum source. A fan system recirculates air between the air vent and the vacuum vent. Dehumidifier may condition the air supply to assist with drying.
Claims
exact text as granted — not AI-modifiedWe claim:
1. A seed flow chamber comprising:
a. an upper inlet opening configured to receive a flow of seed;
b. a lower discharge opening;
c. a diverging guide member disposed below the upper inlet opening;
d. a converging guide member disposed below the diverging guide member, the converging guide member comprising:
i. a downward sloping surface;
ii. an air vent configured to communicate with an air supply;
e. a first vacuum vent configured to communicate with a vacuum source, the first vacuum vent disposed below the diverging guide member; and
f. a fan system configured to recirculate air between the air vent and the first vacuum vent.
2. The seed flow chamber of claim 1 ,
wherein the air vent further comprises a plurality of apertures in the downward sloping surface.
3. The seed flow chamber of claim 1 , wherein the fan system further comprises:
a. a dehumidifier configured to provide conditioned air in the air supply.
4. The seed flow chamber of claim 1 , wherein the diverging guide member extends across a width of the seed flow chamber, the diverging guide member comprising:
a. a first end mounted to a first sidewall of the seed flow chamber; and
b. a second end mounted to a second sidewall of the seed flow chamber.
5. The seed flow chamber of claim 4 , wherein the first vacuum vent is disposed in the first sidewall below and partially surrounded by the first end of the diverging guide member.
6. The seed flow chamber of claim 5 , further comprising:
a. a second vacuum vent configured to communicate with the vacuum source, the second vacuum vent disposed in the second sidewall below and partially surrounded by the second end of the diverging guide member.
7. The seed flow chamber of claim 1 , further comprising:
a. a first airflow path defined between the air vent and the first vacuum vent;
b. a downward seed flow path configured to direct seed falling under the force of gravity from the upper inlet opening, to the diverging guide member, to the converging guide member, and then to the lower discharge opening; and
c. wherein the first airflow path crosses the downward seed flow path at a generally perpendicular angle.
8. The seed flow chamber of claim 1 , wherein the diverging guide member further comprises:
a. a top portion disposed directly below the upper inlet opening such that seed falling therethrough under the force of gravity falls from the upper inlet opening onto the top portion.
9. The seed flow chamber of claim 8 , further comprising:
a. wherein the converging guide member further comprises:
i. a first guiding surface;
ii. a second guiding surface disposed opposite the first guiding surface;
b. wherein the diverging guide member further comprises:
i. a first bottom portion disposed above the first guiding surface; and
ii. a second bottom portion disposed above the second guiding surface.
10. The seed flow chamber of claim 9 , further comprising:
a. a first plenum disposed below the first guiding surface and configured to communicate with the air supply and the air vent; and
b. wherein the air vent comprises a plurality of perforations in the first guiding surface.Cited by (0)
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